scispace - formally typeset
Search or ask a question
Author

A. I. Izhnin

Bio: A. I. Izhnin is an academic researcher from Tomsk State University. The author has contributed to research in topics: Photoluminescence & Molecular beam epitaxy. The author has an hindex of 6, co-authored 14 publications receiving 96 citations.

Papers
More filters
Journal ArticleDOI
TL;DR: In this paper, an ion milling-assisted study of defect structure of HgCdTe films grown by molecular beam epitaxy on Si substrates was performed, and the films appeared to contain initially neutral Te-related defects with concentration of 1017 cm−3.
Abstract: An ion milling-assisted study of defect structure of HgCdTe films grown by molecular beam epitaxy on Si substrates was performed. The films appeared to contain initially neutral Te-related defects with concentration of 1017 cm−3, typical of HgCdTe. The concentration of residual donors was found to be quite low ((3–8) × 1014 cm−3). Specific to HgCdTe/Si technology appeared to be a considerable number of stacking faults, which affected the carrier mobility in n-type material. These defects can be annealed in He atmosphere at 230 °C, and after ion milling the electrical parameters of n-type HgCdTe/Si films approach those of high-quality bulk crystals.

19 citations

Journal ArticleDOI
TL;DR: In this article, the minimum donor doping level required for obtaining n-regions with reproducible electron concentration in HgCdTe-based LWIR and MWIR device structures fabricated with ion treatment was established.
Abstract: Ion milling was used to establish the minimum donor doping level Nmd required for obtaining n-regions with reproducible electron concentration in HgCdTe-based LWIR and MWIR device structures fabricated with ion treatment. The experiments were performed on n-type films grown by molecular beam epitaxy, un-doped and in situ doped with indium with the concentration NIn = 5 × 1014–1017 cm−3. A study of the electrical properties of the milled films showed that Nmd comprised ~2 × 1015 cm−3 for the LWIR and ~5 × 1015 cm−3 for the MWIR films. In the films with NIn exceeding these critical values, the electron concentration after the milling strictly followed the doping. A need for consideration of the disintegration of the milling-induced defects is also shown.

14 citations

Journal ArticleDOI
TL;DR: In this article, a theoretical model for describing the band diagram and the photoluminescence spectra of heteroepitaxial structures based on Cd ≥ Hg1−x Te (MCT) with potential and quantum wells (QW) grown by molecularbeam epitaxy (MBE) is developed.
Abstract: A theoretical model for description of the band diagram and the photoluminescence spectra of heteroepitaxial structures (HES) based on Cd x Hg1–x Te (MCT) with potential and quantum wells (QW) grown by molecularbeam epitaxy (MBE) is developed. A special feature of the model is that the model takes into account the dependence of electron affinity on the MCT composition and temperature as well as the dependence of the electron concentration in intrinsic MCT and hole concentration in vacancy-doped MCT. The calculations are made and the results are compared with the experimental photoluminescence spectra of various structures with QW reported in the literature.

14 citations

Journal ArticleDOI
TL;DR: In this article, the photoluminescence method is used to study acceptor states in CdHgTe heteroepitaxial films (HEFs) grown by molecular-beam epitaxy.
Abstract: The photoluminescence method is used to study acceptor states in CdHgTe heteroepitaxial films (HEFs) grown by molecular-beam epitaxy. A comparison of the photoluminescence spectra of HEFs grown on GaAs substrates (CdHgTe/GaAs) with the spectra of CdHgTe/Si HEFs demonstrates that acceptor states with energy depths of about 18 and 27 meV are specific to CdHgTe/GaAs HEFs. The possible nature of these states and its relation to the HEF synthesis conditions and, in particular, to the vacancy doping occurring under conditions of a mercury deficiency during the course of epitaxy and postgrowth processing are discussed.

9 citations

Journal ArticleDOI
TL;DR: In this article, the photoluminescence of HgCdTe-based hetero-epitaxial nanostructures with 50 to 1100 nm-wide potential wells was studied.
Abstract: Photoluminescence (PL) of HgCdTe-based hetero-epitaxial nanostructures with 50 to 1100 nm-wide potential wells was studied. The nanostructures were grown by molecular beam epitaxy on GaAs substrates. A strong degree of alloy disorder was found in the material, which led to the broadening of the PL spectra and a considerable Stokes shift that could be traced up to temperature T∼230 K. Annealing of the structures improved the ordering and led to the increase in the PL intensity. A remarkable feature of the PL was an unexpectedly small decrease of its intensity with temperature increasing from 84 to 300 K. This effect can be related to localization of carriers at potential fluctuations and to the specific character of Auger-type processes in HgCdTe-based nanostructures.

8 citations


Cited by
More filters
Journal ArticleDOI
TL;DR: In this article, the authors report on stimulated emission at wavelengths up to 19.5μm from HgTe/HgCdTe quantum well heterostructures with wide gap HgCDTe dielectric waveguide, grown by molecular beam epitaxy on GaAs(013) substrates.
Abstract: We report on stimulated emission at wavelengths up to 19.5 μm from HgTe/HgCdTe quantum well heterostructures with wide‐gap HgCdTe dielectric waveguide, grown by molecular beam epitaxy on GaAs(013) substrates. The mitigation of Auger processes in structures under study is exemplified, and the promising routes towards the 20–50 μm wavelength range, where HgCdTe lasers may be competitive to the prominent emitters, are discussed.

59 citations

Journal ArticleDOI
TL;DR: In this paper, the effect of HgCdTe on the terahertz photoconductive response close to the charge neutrality point and at the magnetic field driven topological phase transition was investigated.
Abstract: Due to their specific physical properties, HgCdTe-based heterostructures are expected to play an important role in terahertz photonic systems. Here, focusing on gated devices presenting inverted band ordering, we evidence an enhancement of the terahertz photoconductive response close to the charge neutrality point and at the magnetic field driven topological phase transition. We also show the ability of these heterostructures to be used as terahertz imagers. Regarding terahertz emitters, we present results on stimulated emission of HgCdTe heterostructures in their conventional semiconductor state above 30 THz, discussing the physical mechanisms involved and promising routes towards the 5–15 THz frequency domain.

48 citations

Journal ArticleDOI
TL;DR: In this paper, the energy spectra of the mercury vacancy, the most common acceptor in HgCdTe material, was studied via numerical calculations and low temperature photoconductivity measurements of 'vacancy-doped' Hg CdTe films with low cadmium content, and the model for the helium atom was adopted for degerate valence band of zinc blende semiconductors to classify the observed PC bands.
Abstract: The energy spectra of the mercury vacancy, the most common acceptor in HgCdTe material, is studied via numerical calculations and low temperature photoconductivity (PC) measurements of 'vacancy-doped' HgCdTe films with low cadmium content Since the Hg vacancy is known to be a double acceptor, the model for the helium atom was adopted for degerate valence band of zinc blende semiconductors to classify the observed PC bands This approach provides a fairly good description of the photoionization of both neutral and singly-ionized vacancy when the central cell potential is taken into account

25 citations

Journal ArticleDOI
TL;DR: In this paper, the presence and absence of near-surface graded-gap layers with high content of CdTe was investigated for the case of the presence or absence of a near surface CdTE layer.

24 citations

Journal ArticleDOI
TL;DR: A defect study was performed on arsenic-implanted Hg 1-x Cd x Te (x ǫ = 0.23-0.30) films with graded-gap surface layers, grown with molecular-beam epitaxy on GaAs and Si substrates and designed for fabrication of p + -n-type photodiodes.

21 citations