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A. M. A. El-Barry

Researcher at Ain Shams University

Publications -  13
Citations -  141

A. M. A. El-Barry is an academic researcher from Ain Shams University. The author has contributed to research in topics: Thin film & Dielectric. The author has an hindex of 7, co-authored 13 publications receiving 128 citations.

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Structural and electrical properties of thermally evaporated cobalt phthalocyanine (CoPc) thin films

TL;DR: In this article, the mean free path of charge carriers in CoPc thin films and bulk resistivity was estimated using the CBH model with centers of intimate valence alternation pairs type with a maximum barrier height of 1.594 eV.
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Effects of γ-irradiation and heat treatment on structural, spectral and optical parameters of pyronine G(Y) thin films

TL;DR: In this article, structural properties of pyronine G(Y) thin films have been investigated using X-ray diffraction technique as well as scanning electron microscope and Fourier transformation infrared FTIR.
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Electrical conductivity and dielectric properties of cadmium thiogallate CdGa2S4 thin films

TL;DR: In this paper, the dark electrical resistivity calculations were carried out at different elevated temperatures in the range 303-423 K and in thickness range 235-457 nm and the results obtained are discussed in terms of the non-overlapping small polaron tunneling model.
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Transport mechanisms and photovoltaic characteristics of p-SxSe100-x/n-Si heterojunctions

TL;DR: In this article, the dark currentvoltage characteristics of p-S x Se 100− x /n-Si heterojunctions, with x ǫ= 0, 2.5, 5.8 and 7.28 at, were investigated in a temperature range from 303 to 383 K. Under reverse biasing, the operating conduction mechanism is the generation recombination mechanism.
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Studies on structural and optical properties of thermally evaporated nanocrystalline thin films of meso-Tetraphenylporphyrin manganese(III) chloride

TL;DR: In this paper, the dispersion parameters of meso-Tetraphenylporphyrin manganese(III) chloride (MnTPPCl) thin films were calculated by conventional thermal deposition technique under vacuum (10−4 Pa) on glass and quartz substrates.