A. R. Riben

Bio: A. R. Riben is an academic researcher from Carnegie Institution for Science. The author has contributed to research in topics: Disproportionation & Electrical resistivity and conductivity. The author has an hindex of 3, co-authored 5 publications receiving 420 citations.

Electrical Transport in nGe-pGaAs Heterojunctions†

Abstract: A multi-step recombination-tunnelling model, similar to that used to describe the excess current in tunnel diodes, is developed to explain the observed electrical characteristics of nGe-pGaAs heterodiodes. Two different, but quite similar models are used to qualitatively describe the observed forward and reverse characteristics. Quantitative agreement with the experimental characteristics of the many devices presented is obtained by an empirical modification of the resulting equations. The lack of minority carrier injection in these devices is in agreement with the proposed model.

Electronic properties of CuGaSe2-based heterojunction solar cells. Part I. Transport analysis

Abstract: This article presents a systematic study on the electronic transport mechanisms of CuGaSe2-based thin film solar cells. A variety of samples with different types of stoichiometry deviations, substrates and buffer layers is investigated. We propose two transport models, namely tunneling enhanced volume recombination and tunneling enhanced interface recombination, which allow to explain the observed features for all devices under consideration. The doping level of the absorber layer turns out to be the most decisive parameter for the electronic loss mechanism. The doping is influenced by the type of stoichiometry deviation as well as by the Na content of the substrate. High doping levels result in tunnel assisted recombination. The best solar cells display the lowest tunneling rates. For these devices treatments of the absorber surface by air-annealing and/or the deposition temperature of the CdS buffer layer are decisive for the final device performance. We use the investigation of the open-circuit voltage...

Electrical properties of n-amorphous/p-crystalline silicon heterojunctions

Abstract: We have measured C‐V characteristics and temperature dependence of J‐V characteristics of undoped hydrogenated amorphous silicon (a‐Si:H) heterojunctions formed on p‐type crystalline silicon ( p c‐Si) substrates with different resistivities. It has been found that an abrupt heterojunction model is valid for a‐Si:H/p c‐Si heterojunctions, and the electron affinity of a‐Si:H has been estimated as 3.93±0.07 eV from C‐V characteristics. The forward current of all the junctions studied shows voltage and temperature dependence expressed as exp(−ΔEa f/kT) exp(AV), where ΔEa f and A are constants independent of voltage and temperature, being successfully explained by a multitunneling capture‐emission model. The reverse current is proportional to exp(−ΔEar/kT)(VD−V)1/2, where VD is the diffusion voltage and ΔEar is a constant. This current is probably limited by generation‐recombination process.

Electrical Transport in nGe-pGaAs Heterojunctions†

Abstract: A multi-step recombination-tunnelling model, similar to that used to describe the excess current in tunnel diodes, is developed to explain the observed electrical characteristics of nGe-pGaAs heterodiodes. Two different, but quite similar models are used to qualitatively describe the observed forward and reverse characteristics. Quantitative agreement with the experimental characteristics of the many devices presented is obtained by an empirical modification of the resulting equations. The lack of minority carrier injection in these devices is in agreement with the proposed model.

Diffusion and tunneling currents in GaN/InGaN multiple quantum well light-emitting diodes

Abstract: We have studied the electrical characteristics and optical properties of GaN/InGaN multiple quantum well (MQW) light-emitting diodes (LEDs) grown by metalorganic chemical vapor deposition. It appears that there is an essential link between material quality and the mechanism of current transport through the wide-bandgap p-n junction. Tunneling behavior dominates throughout all injection regimes in a device with a high density of defects in the space-charge region, which act as deep-level carrier traps. However, in a high-quality LED diode, temperature-dependent diffusion-recombination current has been identified with an ideality factor of 1.6 at moderate biases. Light output has been found to follow a power law, i.e., L /spl prop/ I/sup m/ in both devices. In the high-quality LED, nonradiative recombination centers are saturated at current densities as low as 1.4 /spl times/ 10/sup -2/ A/cm/sup 2/. This low saturation level indicates that the defects in GaN, especially the high density of edge dislocations, are generally optically inactive.

Nitric acid oxidation of Si to form ultrathin silicon dioxide layers with a low leakage current density

Abstract: Ultrathin silicon dioxide (SiO2) layers with excellent electrical characteristics can be formed using the nitric acid oxidation of Si (NAOS) method, i.e., by immersion of Si in nitric acid (HNO3) solutions. The SiO2 layer formed with 61 wt % HNO3 at its boiling temperature of 113 °C has a 1.3 nm thickness with a considerably high density leakage current. When the SiO2 layer is formed in 68 wt % HNO3 (i.e., azeotropic mixture with water), on the other hand, the leakage current density (e.g., 1.5 A/cm2 at the forward gate bias, VG, of 1 V) becomes as low as that of thermally grown SiO2 layers, in spite of the nearly identical SiO2 thickness of 1.4 nm. Due to the relatively low leakage current density of the NAOS oxide layer, capacitance–voltage (C–V) curves can be measured in spite of the ultrathin oxide thickness. However, a hump is present in the C–V curve, indicating the presence of high-density interface states. Fourier transformed infrared absorption measurements show that the atomic density of the SiO...