A. Sohmer

Bio: A. Sohmer is an academic researcher from University of Stuttgart. The author has contributed to research in topics: Quantum well & Heterojunction. The author has an hindex of 10, co-authored 18 publications receiving 790 citations.

Reduction of oscillator strength due to piezoelectric fields in G a N / A l x Ga 1 − x N quantum wells

Abstract: We demonstrate a dramatic reduction of the oscillator strength in ${\mathrm{G}\mathrm{a}\mathrm{N}/\mathrm{A}\mathrm{l}}_{x}{\mathrm{Ga}}_{1\ensuremath{-}x}\mathrm{N}$ quantum wells due to piezoelectric fields. Our study using time-resolved photoluminescence spectroscopy reveals a strong increase of the luminescence decay time of the dominating transition with increasing well width by several orders of magnitude in parallel to a redshift of the emission peaks. The experimental results are consistently explained by a quantitative model based on the piezoelectric fields in strained wurtzite quantum wells. We estimate the piezoelectric constant of GaN to ${d}_{31}=\ensuremath{-}0.9\ifmmode\times\else\texttimes\fi{}{10}^{\ensuremath{-}10}$ cm/V.

Absorption of InGaN Single Quantum Wells Determined by Photothermal Deflection Spectroscopy.

Abstract: Photothermal deflection spectroscopy (PDS) is used to study the absorption of GaN/InGaN/GaN double heterostructures in the energy range from 0.6 to 3.8 eV. The heterostructures containing 1–77-nm-thick InGaN single quantum wells were deposited by chemical vapour deposition from organometallic precursors. They are measured to investigate the absorption coefficient, bandgap, indium concentration and fluctuation of the quantum wells. A bandgap increase of hexagonal InxGa1-xN (x≈0.14) of 60 meV is observed with decreasing well thicknesses from 15 to 1 nm. The distribution of In-concentration of the InxGa1-xN layers was estimated from the slope of the absorption coefficient versus photon energy for energies below the bandgap and found to be Gaussian with a full width of half maximum of Δx=0.03.

Diffusion length of photoexcited carriers in GaN

Abstract: When additional carriers are introduced in a material with a non uniform concentration, they tend to diffuse on a scale given by their diffusion length. This parameter can be measured by different methods. Depending on the conditions, different values can be found as the recombination mechanisms differ. In this paper, we present the situation in GaN with various experiments including the photocarrier grating method, photoluminescence and the spectral response in photoconductors. We show that the diffusion length varies from 0.1 μm to a few μm depending on experimental conditions. The interpretation is given based on the diffusion equations and on the analysis of the recombinations.

Effects of Piezoelectric Fields in GaInN/GaN and GaN/AlGaN Heterostructures and Quantum Wells

Abstract: The effects of piezoelectric fields on the static and dynamic optical properties of GaInN/GaN and GaN/AIGaN double heterostructures and single quantum wells are studied by time-resolved photoluminescence. We find a strong increase of the luminescence decay time of the dominating transition with well thickness by several orders of magnitude. For well thicknesses larger than about 5 nm, two emission lines with strongly differing decay times are observed, which are attributed to spatially direct and indirect transitions. Our experimental findings are consistently explained by a quantitative model based on the piezoelectric fields in strained wurtzite quantum wells.

In incorporation efficiency and composition fluctuations in MOVPE grown GaInN/GaN hetero structures and quantum wells

Abstract: GaInN layers play a key role in short wavelength optoelectronic devices for the visible spectrum. However, the epitaxial growth of In containing nitrides is more problematic than that of GaN and AlGaN. In order to increase the In incorporation efficiency, lower growth temperatures of around 700–800°C are needed. We have optimized the metalorganic vapor-phase epitaxial growth of GaInN by decreasing the H2/N2 ratio in the gas-phase and increasing the growth rate. However, the deposited films showed strong indications for compositional fluctuations. Besides a large miscibility gap predicted for GaInN, the mismatch induced strain for GaN may play a major role in these growth problems.

Band parameters for nitrogen-containing semiconductors

Abstract: We present a comprehensive and up-to-date compilation of band parameters for all of the nitrogen-containing III–V semiconductors that have been investigated to date. The two main classes are: (1) “conventional” nitrides (wurtzite and zinc-blende GaN, InN, and AlN, along with their alloys) and (2) “dilute” nitrides (zinc-blende ternaries and quaternaries in which a relatively small fraction of N is added to a host III–V material, e.g., GaAsN and GaInAsN). As in our more general review of III–V semiconductor band parameters [I. Vurgaftman et al., J. Appl. Phys. 89, 5815 (2001)], complete and consistent parameter sets are recommended on the basis of a thorough and critical review of the existing literature. We tabulate the direct and indirect energy gaps, spin-orbit and crystal-field splittings, alloy bowing parameters, electron and hole effective masses, deformation potentials, elastic constants, piezoelectric and spontaneous polarization coefficients, as well as heterostructure band offsets. Temperature an...

Gan : processing, defects, and devices

Abstract: The role of extended and point defects, and key impurities such as C, O, and H, on the electrical and optical properties of GaN is reviewed. Recent progress in the development of high reliability contacts, thermal processing, dry and wet etching techniques, implantation doping and isolation, and gate insulator technology is detailed. Finally, the performance of GaN-based electronic and photonic devices such as field effect transistors, UV detectors, laser diodes, and light-emitting diodes is covered, along with the influence of process-induced or grown-in defects and impurities on the device physics.

Growth and applications of Group III-nitrides

Abstract: Recent research results pertaining to InN, GaN and AlN are reviewed, focusing on the different growth techniques of Group III-nitride crystals and epitaxial films, heterostructures and devices. The chemical and thermal stability of epitaxial nitride films is discussed in relation to the problems of deposition processes and the advantages for applications in high-power and high-temperature devices. The development of growth methods like metalorganic chemical vapour deposition and plasma-induced molecular beam epitaxy has resulted in remarkable improvements in the structural, optical and electrical properties. New developments in precursor chemistry, plasma-based nitrogen sources, substrates, the growth of nucleation layers and selective growth are covered. Deposition conditions and methods used to grow alloys for optical bandgap and lattice engineering are introduced. The review is concluded with a description of recent Group III-nitride semiconductor devices such as bright blue and white light-emitting diodes, the first blue-emitting laser, high-power transistors, and a discussion of further applications in surface acoustic wave devices and sensors.

LEDs for Solid-State Lighting: Performance Challenges and Recent Advances

Abstract: Over the past decade, advances in LEDs have enabled the potential for wide-scale replacement of traditional lighting with solid-state light sources. If LED performance targets are realized, solid-state lighting will provide significant energy savings, important environmental benefits, and dramatically new ways to utilize and control light. In this paper, we review LED performance targets that are needed to achieve these benefits and highlight some of the remaining technical challenges. We describe recent advances in LED materials and novel device concepts that show promise for realizing the full potential of LED-based white lighting.

Strain-induced polarization in wurtzite III-nitride semipolar layers

Abstract: This paper presents growth orientation dependence of the piezoelectric polarization of InxGa1−xN and AlyGa1−yN layers lattice matched to GaN. This topic has become relevant with the advent of growing nitride based devices on semipolar planes [A. Chakraborty et al., Jpn. J. Appl. Phys., Part 2 44, L945 (2005)]. The calculations demonstrate that for strained InxGa1−xN and AlyGa1−yN layers lattice matched to GaN, the piezoelectric polarization becomes zero for nonpolar orientations and also at another point ≈45° tilted from the c plane. The zero crossover has only a very small dependence on the In or Al content of the ternary alloy layer. With the addition of spontaneous polarization, the angle at which the total polarization equals zero increases slightly for InxGa1−xN, but the exact value depends on the In content. For AlyGa1−yN mismatched layers the effect of spontaneous polarization becomes important by increasing the crossover point to ∼70° from c-axis oriented films. These calculations were performed u...