A Sv Sudbo

Bio: A Sv Sudbo is an academic researcher. The author has contributed to research in topics: Method of lines & Numerical linear algebra. The author has an hindex of 1, co-authored 1 publications receiving 196 citations.

Film mode matching: a versatile numerical method for vector mode field calculations in dielectric waveguides

Abstract: The old film mode matching or transverse resonance method for calculating mode fields in dielectric waveguides is given a new formulation that makes it an efficient, accurate, and general numerical method, ready to exploit standard computer libraries for numerical linear algebra. Both the scalar and the vector field cases are treated for a rather general class of waveguide cross sections, where the method (like the method of lines) is more accurate and more efficient than sophisticated finite-element and finite-difference methods.

Label-Free Biosensing With a Slot-Waveguide-Based Ring Resonator in Silicon on Insulator

Abstract: We present a slot-waveguide-based ring resonator in silicon on insulator (SOI) with a footprint of only 13 mum times 10 mum, fabricated with optical lithography. Experiments show that it has 298 nm/RIU sensitivity and a detection limit of 4.2middot10-5 RIU for changes in the refractive index of the top cladding. We prove for the first time that surface chemistry for selective label-free sensing of proteins can be applied inside a 100 nm-wide slot region and demonstrate that the application of a slot waveguide instead of a normal waveguide increases the sensitivity of an SOI ring resonator with a factor 3.5 for the detection of proteins.

Applications of magneto-optical waveguides in integrated optics: review

Abstract: Magnetooptical garnets combine high Faraday rotation with low optical losses in the near infrared region where optical communication via glass ?ber is established. In this spectral range garnets are the only materials discussed to realize nonreciprocal devices as optical isolators and circulators. Although such devices are available as microoptical components, practical versions of their integrated counterparts are still lacking. Numerous concepts have been developed theoretically many of which are tested experimentally. This paper presents an overview of the state of the art of the applications of garnet films in integrated optics. Also the technique of combining garnets with semiconductor materials is shortly discussed.

Eigenmode expansion methods for simulation of optical propagation in photonics: Pros and cons

Abstract: With the rapid growth of the telecommunications industry over the last 5 to 10 years has come the need to solve ever more complex electromagnetic problems and to solve them more precisely than ever before. The basic EME (EigenMode Expansion) technique is a powerful method for calculation of electromagnetic propagation which has been well known amongst academic environments and also in microwave fields, representing the electromagnetic fields everywhere in terms of a basis set of local modes. It is at the same time a rigorous solution of Maxwell's Equations and is able to deal with very long structures. We discuss here progress that the authors and others have made recently in applying and extending it to integrated, fibre, and diffractive optics - including development of efficient ways of modelling tapers and other smoothly varying structures, new more efficient boundary conditions and improved mode finders. We outline the advantages it has over other techniques and also its limitations. We illustrate its application with a variety of real life examples, including diffractive elements, directional couplers, tapers, MMI's, bend modelling, periodic structures and others.

Fabrication tolerant polarization splitter and rotator based on a tapered directional coupler

Abstract: A polarization splitter and rotator (PSR) based on a tapered directional coupler with relaxed fabrication tolerance is proposed and demonstrated on the silicon-on-insulator platform. The device is simply constructed by parallel-coupling a narrow silicon waveguide with a linearly tapered wider waveguide. Compared to previously reported PSRs based on a normal directional coupler, which suffer from stringent requirements on the accuracy of the narrow waveguide width, the introduced tapered structure of the wide waveguide can be used to compensate the fabrication errors of the narrow waveguide. In addition, only a single step of exposure and etching is needed for the fabrication of the device. Similar high conversion efficiencies are experimentally demonstrated for a narrow waveguide width deviation of 14 nm with large tolerance to the coupler length.

Comparison among various Si/sub 3/N/sub 4/ waveguide geometries grown within a CMOS fabrication pilot line

Abstract: Low-pressure chemical-vapor deposition (LPCVD) thin-film Si/sub 3/N/sub 4/ waveguides have been fabricated on Si substrate within a complementary metal-oxide-semiconductor (CMOS) fabrication pilot line. Three kinds of geometries (channel, rib, and strip-loaded) have been simulated, fabricated, and optically characterized in order to optimize waveguide performances. The number and optical confinement factors of guided optical modes have been simulated, taking into account sidewall effects caused by the etching processes, which have been studied by scanning electron microscopy. Optical guided modes have been observed with a mode analyzer and compared with simulation expectations to confirm the process parameters. Propagation loss measurements at 780 and 632.8 nm have been performed by both using the cutback technique and measuring the drop of intensity of the top scattered light along the length of the waveguide. Loss coefficients of approximately 0.1 dB/cm have been obtained for channel waveguides. These data are very promising in view of the development of Si-integrated photonics.