Showing papers by "Akira Kinbara published in 1990"
TL;DR: In this article, the effects of Ar discharge gas pressure on the structural, electrical and mechanical properties of the sputtered LaB 6 films were examined by X-ray diffraction and emission spectrochemical technique (ICP).
21 citations
TL;DR: In this paper, amorphous carbon films (∼40 nm thick ) were prepared on the wall of a discharge vessel using methane plasma CVD and the films were exposed to a hydrogen and helium glow discharge.
3 citations
1 citations
TL;DR: In this paper, the electrical properties of boron-doped polycrystalline silicon films with the average grain size of 50 nm and of 370 nm have been investigated and it is shown that Hall mobility is strongly dependent on the grain size, and the temperature dependence is changed by hydrogen-plasma treatment (HPT).
Abstract: The electrical properties have been investigated on boron-doped polycrystalline silicon films with the average grain size of 50 nm and of 370 nm. It is shown that Hall mobility is strongly dependent on the grain size, and the temperature dependence is changed by hydrogen-plasma treatment (HPT). After the treatment in the larger grain film, the mobility of about 40 cm2/V sec is obtained and it shows the boron acceptor level of 0.043 eV, which is almost the same as that of the level in monocrystalline silicon. A kink in the mobility vs temperature curve which is observed in the smaller grain film disappears by HPT. These phenomena will be discussed in relation to the density of the trapping states at the grain boundary of the films.
1 citations