Surface plasmons (SPs) are coherent oscillations of conduction electrons on a metal surface excited by electromagnetic radiation at a metal -dielectric interface. The growing field of research on such light -metal interactions is known as ‘plasmonics’. 1-3 This branch of research has attracted much attention due to its potential applications in miniaturized optical devices, sensors, and photonic circuits as well as in medical diagnostics and therapeutics. 4-8

Nanostructured plasmonic sensors.

Two-photon excitation provides a means of activating chemical or physical processes with high spatial resolution in three dimensions and has made possible the development of three-dimensional fluorescence imaging, optical data storage, and lithographic microfabrication. These applications take advantage of the fact that the two-photon absorption probability depends quadratically on intensity, so under tight-focusing conditions, the absorption is confined at the focus to a volume of order λ3 (where λ is the laser wavelength). Any subsequent process, such as fluorescence or a photoinduced chemical reaction, is also localized in this small volume. Although three-dimensional data storage and microfabrication have been illustrated using two-photon-initiated polymerization of resins incorporating conventional ultraviolet-absorbing initiators, such photopolymer systems exhibit low photosensitivity as the initiators have small two-photon absorption cross-sections (δ). Consequently, this approach requires high laser power, and its widespread use remains impractical. Here we report on a class of π;-conjugated compounds that exhibit large δ (as high as 1, 250 × 10−50 cm4 s per photon) and enhanced two-photon sensitivity relative to ultraviolet initiators. Two-photon excitable resins based on these new initiators have been developed and used to demonstrate a scheme for three-dimensional data storage which permits fluorescent and refractive read-out, and the fabrication of three-dimensional micro-optical and micromechanical structures, including photonic-bandgap-type structures.

Two-photon polymerization initiators for three-dimensional optical data storage and microfabrication

Nanoimprint lithography (NIL) is a nonconventional lithographic technique for high-throughput patterning of polymer nanostructures at great precision and at low costs. Unlike traditional lithographic approaches, which achieve pattern definition through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the resist material and can therefore achieve resolutions beyond the limitations set by light diffraction or beam scattering that are encountered in conventional techniques. This Review covers the basic principles of nanoimprinting, with an emphasis on the requirements on materials for the imprinting mold, surface properties, and resist materials for successful and reliable nanostructure replication.

/pdf/nanoimprint-lithography-methods-and-material-requirements-csc83swyi1.pdf

Nanoimprint Lithography: Methods and Material Requirements**

SU-8 has become the favourite photoresist for high-aspect-ratio (HAR) and three-dimensional (3D) lithographic patterning due to its excellent coating, planarization and processing properties as well as its mechanical and chemical stability. However, as feature sizes get smaller and pattern complexity increases, particular difficulties and a number of material-related issues arise and need to be carefully considered. This review presents a detailed description of these effects and describes reported strategies and achieved SU-8 HAR and 3D structures up to August 2006.

https://iopscience.iop.org/article/10.1088/0960-1317/17/6/R01/pdf

SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography

It has been possible to produce photon vortex beams — optical beams with spiralling wavefronts — for some time, and they have found widespread application as optical tweezers, in interferometry and in information transfer, for example. The production of vortex beams of electrons was demonstrated earlier this year (
 http://go.nature.com/4H2xWR
 ) in a procedure involving the passage of electrons through a spiral stack of graphite thin films. The ability to generate such beams reproducibly in a conventional electron microscope would enable many new applications. Now Jo Verbeeck and colleagues have taken a step towards that goal. They describe a versatile holographic technique for generating these twisted electron beams, and demonstrate their potential use as probes of a material's magnetic properties. It was demonstrated recently that passing electrons through a spiral stack of graphite thin films generates an electron beam with orbital angular momentum — analogous to the spiralling wavefronts that can be introduced in photon beams and which have found widespread application. Here, a versatile holographic technique for generating these twisted electron beams is described. Moreover, a demonstration is provided of their potential use in probing a material's magnetic properties. Vortex beams (also known as beams with a phase singularity) consist of spiralling wavefronts that give rise to angular momentum around the propagation direction. Vortex photon beams are widely used in applications such as optical tweezers to manipulate micrometre-sized particles and in micro-motors to provide angular momentum1,2, improving channel capacity in optical3 and radio-wave4 information transfer, astrophysics5 and so on6. Very recently, an experimental realization of vortex beams formed of electrons was demonstrated7. Here we describe the creation of vortex electron beams, making use of a versatile holographic reconstruction technique in a transmission electron microscope. This technique is a reproducible method of creating vortex electron beams in a conventional electron microscope. We demonstrate how they may be used in electron energy-loss spectroscopy to detect the magnetic state of materials and describe their properties. Our results show that electron vortex beams hold promise for new applications, in particular for analysing and manipulating nanomaterials, and can be easily produced.

Production and application of electron vortex beams

Contact resistance in organic thin film transistors

Axicon lens on optical fiber forming optical tweezers, made by focused ion beam milling

Focused ion beam lithography for two dimensional array structures for photonic applications

Ordered arrays of nanoelectrodes for electrochemical use are prepared by electron beam lithography (EBL) using polycarbonate as a novel e-beam resist. The nanoelectrodes are fabricated by patterning arrays of holes in a thin film of polycarbonate spin-coated on a gold layer on Si/Si3N4 substrate. Experimental parameters for the successful use of polycarbonate as high resolution EBL resist are optimized. The holes can be filled partially or completely by electrochemical deposition of gold. This enables the preparation of arrays of nanoelectrodes with different recession degree and geometrical characteristics. The polycarbonate is kept on-site and used as the insulator that separates the nanoelectrodes. The obtained nanoelectrode arrays (NEAs) exhibit steady state current controlled by pure radial diffusion in cyclic voltammetry for scan rates up to approximately 50  mV s − 1. Electrochemical results showed satisfactory agreement between experimental voltammograms and suitable theoretical models. Finally, the peculiarities of NEAs versus ensembles of nanoelectrodes, obtained by membrane template synthesis, are critically evaluated.

https://iopscience.iop.org/article/10.1088/0957-4484/22/18/185305/pdf

Polycarbonate-based ordered arrays of electrochemical nanoelectrodes obtained by e-beam lithography.

Manufacturers of hearing aids have made initial testing of rapid prototyping of hearing aid shells using laser scans of ear impressions, but they have not performed any actual scans of the human ear canal. We report the direct scanning of the human external auditory canal by using an electromagnetically actuated torsion micromirror fabricated by using a micromachining technique as the scanner. This demonstrates the actual scanning of the human external auditory canal by a single integral microelectro-optical-mechanical system (MEOMS). A prototype three-dimensional (3D) scanning system was developed: It is based on the acquisition of optical range data by a conoscopic holographic laser interferometer using an electromagnetically actuated scanning MEOMS micromirror. A fabrication process, based on a poly(methylmethacrylate) sacrificial layer for the fabrication of a free-standing micromirror was used. Micromirror actuation was achieved by using a magnetic field generated with an electromagnetic coil stick. ...

Alessandro Carpentiero

Papers

Contact resistance in organic thin film transistors

Axicon lens on optical fiber forming optical tweezers, made by focused ion beam milling

Focused ion beam lithography for two dimensional array structures for photonic applications

Polycarbonate-based ordered arrays of electrochemical nanoelectrodes obtained by e-beam lithography.

Three-dimensional digital scanner based on micromachined micromirror for the metrological measurement of the human ear canal