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Alexander Diener
Researcher at German National Metrology Institute
Publications - 20
Citations - 333
Alexander Diener is an academic researcher from German National Metrology Institute. The author has contributed to research in topics: Electrode & Chemistry. The author has an hindex of 8, co-authored 14 publications receiving 293 citations.
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Journal ArticleDOI
Accurate and traceable calibration of two-dimensional gratings
Gaoliang Dai,Frank Pohlenz,Thorsten Dziomba,Min Xu,Alexander Diener,Ludger Koenders,Hans-Ulrich Danzebrink +6 more
TL;DR: In this paper, the calibration of 1D and 2D gratings is performed using a metrological large range scanning probe microscope with optimized measurement strategies, and two different kinds of data evaluation methods, a gravity center method and a Fourier transform method, are developed and investigated.
Journal ArticleDOI
Multi-wavelength VIS/UV optical diffractometer for high-accuracy calibration of nano-scale pitch standards
TL;DR: In this paper, a rotary table is used to measure the lateral period of gratings in the micro and nanometre scale, where the incident and diffracted laser beams are almost collinear.
Journal ArticleDOI
Metrology of nanoscale grating structures by UV scatterometry
TL;DR: A novel geometry parameterization is introduced which overcomes some limitations of the default parameterization of goniometric scatterometry measurements of gratings with linewidths down to 25 nm on silicon wafers with an inspection wavelength of 266 nm.
Proceedings ArticleDOI
EUV and DUV scatterometry for CD and edge profile metrology on EUV masks
TL;DR: In this article, the authors measured a prototype EUV mask both with an EUV scatterometer and a conventional scatterometer operated at 193 nm and compared the results with AFM and CD-SEM measurements provided to them by the mask supplier.
Proceedings ArticleDOI
Picometer-scale accuracy in pitch metrology by optical diffraction and atomic force microscopy
TL;DR: In this article, the authors measured the pitch of a 144-nm pitch, two-dimensional grid in two different laboratories using optical diffraction and atomic force microscopy (AFM).