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Author

Annette Grot

Other affiliations: Avago Technologies
Bio: Annette Grot is an academic researcher from Agilent Technologies. The author has contributed to research in topics: Photonic crystal & Refractive index. The author has an hindex of 10, co-authored 29 publications receiving 1189 citations. Previous affiliations of Annette Grot include Avago Technologies.

Papers
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Journal ArticleDOI
TL;DR: By measuring the resonant wavelength of a two-dimensional photonic crystal microcavity, a time-resolved sensing capability is demonstrated that can detect the change in refractive index of 0.002.
Abstract: We report an experimental demonstration of an ultracompact biochemical sensor based on a two-dimensional photonic crystal microcavity. The microcavity, fabricated on a silicon-on-insulator substrate, is designed to have a resonant wavelength (λ) near 1.5 µm. The transmission spectrum of the sensor is measured with different ambient refractive indices ranging from n=1.0 to n=1.5. From observation of the shift in resonant wavelength, a change in ambient refractive index of Δn=0.002 is readily apparent. The correspondence between absolute refractive index and resonant wavelength agrees with numerical calculation to within 4% accuracy. The evaporation of water in a 5% glycerol mixture is also used to demonstrate the capability for in situ time-resolved sensing.

454 citations

Proceedings ArticleDOI
21 May 2004
TL;DR: By measuring the resonant wavelength of a two-dimensional photonic crystal microcavity, Wang et al. as discussed by the authors detected the change in refractive index of 0.002 using water in 5% glycerol.
Abstract: By measuring the resonant wavelength of a two-dimensional photonic crystal microcavity, we can detect the change in refractive index of 0.002. Evaporative process of water in 5% glycerol is used to demonstrate time-resolved sensing capability

223 citations

Proceedings ArticleDOI
21 Jul 2000
TL;DR: Step and Flash Imprint Lithography (SFIL) is an alternative to photolithography that efficiently generates high aspect-ratio, sub-micron patterns in resist materials as mentioned in this paper.
Abstract: Step and Flash Imprint Lithography (SFIL) is an alternative to photolithography that efficiently generates high aspect-ratio, sub-micron patterns in resist materials. Other imprint lithography techniques based on physical deformation of a polymer to generate surface relief structures have produced features in PMMA as small as 10 nm, but it is very difficult to imprint large depressed features or to imprint a thick films of resist with high aspect-ratio features by these techniques. SFIL overcomes these difficulties by exploiting the selectivity and anisotropy of reactive ion etch (RIE). First, a thick organic 'transfer' layer (0.3 micrometer to 1.1 micrometer) is spin coated to planarize the wafer surface. A low viscosity, liquid organosilicon photopolymer precursor is then applied to the substrate and a quartz template applied at 2 psi. Once the master is in contact with the organosilicon solution, a crosslinking photopolymerization is initiated via backside illumination with broadband UV light. When the layer is cured the template is removed. This process relies on being able to imprint the photopolymer while leaving the minimal residual material in the depressed areas. Any excess material is etched away using a CHF3/He/O2 RIE. The exposed transfer layer is then etched with O2 RIE. The silicon incorporated in the photopolymer allows amplification of the low aspect ratio relief structure in the silylated resist into a high aspect ratio feature in the transfer layer. The aspect ratio is limited only by the mechanical stability of the transfer layer material and the O2 RIE selectivity and anisotropy. This method has produced 60 nm features with 6:1 aspect ratios. This lithography process was also used to fabricate alternating arrays of 100 nm Ti lines on a 200 nm pitch that function as efficient micropolarizers. Several types of optical devices including gratings, polarizers, and sub-wavelength structures can be easily patterned by SFIL.© (2000) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

153 citations

Journal ArticleDOI
TL;DR: In this paper, a photonic crystal microcavity sensor was used to measure the binding of anti-biotin to biotinylated-bovine serum albumin (b-BSA).
Abstract: We report on time-resolved label-free monitoring of protein binding in a physiological buffer using a photonic crystal microcavity sensor of total area 50 μm2 with an effective detection area of 0.272 μm2. We use this ultracompact sensor to monitor the binding of anti-biotin to biotinylated-bovine serum albumin (b-BSA), and measure an affinity constant of 6.94 × 107 M−1. We show that this photonic crystal sensor can be used for anti-biotin detection at concentrations ranging from picomolar to micromolar. The lower limit of detection for anti-biotin is less than 20 pM, corresponding to less than 4.5 fg of bound material on the sensor surface and fewer than 80 molecules in the modal volume of the microcavity. The sensor also has the capability of measuring binding of small molecular species such as aromatic rings (98 Da). Furthermore, we show that the active surface of the sensor can be successfully regenerated and re-used in subsequent protein binding experiments. A comparison of experimental and theoretical data is given, and the current experimental limitations of the sensor with regard to noise are discussed.

120 citations

Journal ArticleDOI
TL;DR: In this paper, the authors describe the step and flash imprint lithography (SFIL) process, the development of a multilayer etch scheme that produces 6:1 aspect ratio features with 60 nm linewidths, a method for patterning high-aspect ratio featu...
Abstract: Step and flash imprint lithography (SFIL) is a technique that has the potential to replace photolithography for patterning resist with sub-100 nm features. SFIL is a low cost, high throughput alternative to conventional photolithography for high-resolution patterning. It is a molding process in which the topography of a template defines the patterns created on a substrate. The ultimate resolution of replication by imprint lithography is unknown but, to date, it has only been limited by the size of the structures that can be created on the template. It is entirely possible to faithfully replicate structures with minimum features of a few hundred angstroms. SFIL utilizes a low-viscosity, photosensitive silylated solution that exhibits high etch contrast with respect to organic films in O2 reactive ion etching. In this article we describe the SFIL process, the development of a multilayer etch scheme that produces 6:1 aspect ratio features with 60 nm linewidths, a method for patterning high-aspect-ratio featu...

63 citations


Cited by
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Journal ArticleDOI
TL;DR: This article reviews the recent progress in optical biosensors that use the label-free detection protocol, in which biomolecules are unlabeled or unmodified, and are detected in their natural forms, and focuses on the optical biosENSors that utilize the refractive index change as the sensing transduction signal.

2,060 citations

Journal ArticleDOI
TL;DR: Some of the exciting developments so far in miniaturized optofluidic platforms bring fluid and light together and exploit their microscale interaction for a large variety of applications are overviewed.
Abstract: The realization of miniaturized optofluidic platforms offers potential for achieving more functional and more compact devices. Such integrated systems bring fluid and light together and exploit their microscale interaction for a large variety of applications. The high sensitivity of compact microphotonic devices can generate effective microfluidic sensors, with integration capabilities. By turning the technology around, the exploitation of fluid properties holds the promise of highly flexible, tunable or reconfigurable microphotonic devices. We overview some of the exciting developments so far.

946 citations

Journal ArticleDOI
TL;DR: A rigorous definition for the detection limit of resonant RI sensors is set forth that accounts for all parameters that affect the detection performance and will lead to design strategies for performance improvement of RI sensors.
Abstract: Refractive index (RI) sensors based on optical resonance techniques are receiving a high degree of attention because of the need to develop simple, low-cost, high-throughput detection technologies for a number of applications. While the sensing mechanism of most of the reported RI sensors is similar, the construction is quite different from technique to technique. It is desirable to have a uniform mechanism for comparing the various RI sensing techniques, but to date there exists a degree of variation as to how the sensing performance is quantified. Here we set forth a rigorous definition for the detection limit of resonant RI sensors that accounts for all parameters that affect the detection performance. Our work will enable a standard approach for quantifying and comparing the performance of optical resonance-based RI sensors. Additionally, it will lead to design strategies for performance improvement of RI sensors.

942 citations

Journal ArticleDOI
Bruce D. Terris1, T. Thomson1
TL;DR: Nanofabrication of magnetic storage media, where servo marks, discrete tracks or individual islands are defined, offers the prospect for improved performance and increased areal density as discussed by the authors.
Abstract: Nanofabrication of magnetic storage media, where servo marks, discrete tracks or individual islands are defined, offer the prospect for improved performance and increased areal density. However, this increase in performance will require that new and additional processes be introduced into disk manufacturing. We review here the fundamental patterning and fabrication processes that have been proposed, along with their respective strengths and weaknesses and the potential advantages they may offer for magnetic recording. The increase in data density afforded by nanofabrication may have added significance as more conventional approaches to ever increasing density will encounter physical limitations set by the thermal stability of the recorded bits.

824 citations