Avram Bar-Cohen

Bio: Avram Bar-Cohen is an academic researcher from University of Maryland, College Park. The author has contributed to research in topics: Heat transfer & Heat sink. The author has an hindex of 50, co-authored 329 publications receiving 8329 citations. Previous affiliations of Avram Bar-Cohen include Auburn University & DARPA.

Heat Transfer and Two-Phase Flow Regimes in Manifolded Microgaps: Performance Comparison Between R245fa and FC-72

Abstract: Two-phase embedded cooling has great potential for meeting the increasing thermal management needs of high-heat flux electronics. The use of manifold-microchannels further enhances the effectiveness of embedded cooling while maintaining low pressure drop and pumping power. Previous research has shown that thermodynamic quality drives the thermo-fluid phenomena in the channel, including the prevailing flow regime, the transition to dryout, and the local heat transfer coefficients. The flow phenomena are also strongly dependent on the properties of the working fluid. The current study investigates the performance of FC-72 and R245fa in an enlarged visualization manifold-microchannel, referred to as a "microgap" channel.

Silicon Hot Spot Remediation With a Germanium Self Cooling Layer

Abstract: Driven by shrinking feature sizes, microprocessor hot spots have emerged as the primary driver for on-chip cooling of today’s IC technologies. Current thermal management technologies offer few choices for such on-chip hot spot remediation. A solid state germanium self-cooling layer, fabricated on top of the silicon chip, is proposed and demonstrated to have great promise for reducing the severity of on-chip hot spots. 3D thermo-electrical coupled simulations are used to investigate the effectiveness of a bi-layer device containing a germanium self-cooling layer above an electrically insulated silicon layer. The parametric variables of applied current, cooler size, silicon percentage, and total die thickness are sequentially optimized for the lowest hot spot temperature compared to a non-self-cooled silicon chip. Results suggest that the localized self-cooling of the germanium layer coupled with the higher thermal conductivity of the silicon chip can significantly reduce the temperature rise resulting from a micro-scaled hot spot.© 2011 ASME

Light-emitting diodes

Abstract: Light-Emitting Diodes. (Monographs in Electrical and Electronic Engineering.) By A. A. Bergh and P. J. Dean. Pp. viii+591. (Clarendon: Oxford; Oxford University: London, 1976.) £22.

A review of Ga2O3 materials, processing, and devices

Abstract: Gallium oxide (Ga2O3) is emerging as a viable candidate for certain classes of power electronics, solar blind UV photodetectors, solar cells, and sensors with capabilities beyond existing technologies due to its large bandgap. It is usually reported that there are five different polymorphs of Ga2O3, namely, the monoclinic (β-Ga2O3), rhombohedral (α), defective spinel (γ), cubic (δ), or orthorhombic (e) structures. Of these, the β-polymorph is the stable form under normal conditions and has been the most widely studied and utilized. Since melt growth techniques can be used to grow bulk crystals of β-GaO3, the cost of producing larger area, uniform substrates is potentially lower compared to the vapor growth techniques used to manufacture bulk crystals of GaN and SiC. The performance of technologically important high voltage rectifiers and enhancement-mode Metal-Oxide Field Effect Transistors benefit from the larger critical electric field of β-Ga2O3 relative to either SiC or GaN. However, the absence of clear demonstrations of p-type doping in Ga2O3, which may be a fundamental issue resulting from the band structure, makes it very difficult to simultaneously achieve low turn-on voltages and ultra-high breakdown. The purpose of this review is to summarize recent advances in the growth, processing, and device performance of the most widely studied polymorph, β-Ga2O3. The role of defects and impurities on the transport and optical properties of bulk, epitaxial, and nanostructures material, the difficulty in p-type doping, and the development of processing techniques like etching, contact formation, dielectrics for gate formation, and passivation are discussed. Areas where continued development is needed to fully exploit the properties of Ga2O3 are identified.

Low loss dielectric materials for LTCC applications: a review

Abstract: Small, light weight and multifunctional electronic components are attracting much attention because of the rapid growth of the wireless communication systems and microwave products in the consumer electronic market. The component manufacturers are thus forced to search for new advanced integration, packaging and interconnection technologies. One solution is the low temperature cofired ceramic (LTCC) technology enabling fabrication of three-dimensional ceramic modules with low dielectric loss and embedded silver electrodes. During the past 15 years, a large number of new dielectric LTCCs for high frequency applications have been developed. About 1000 papers were published and ∼500 patents were filed in the area of LTCC and related technologies. However, the data of these several very useful materials are scattered. The main purpose of this review is to bring the data and science of these materials together, which will be of immense help to researchers and technologists all over the world. The comme...