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B. Neethi Simon

Researcher at Indian Institute of Technology Madras

Publications -  7
Citations -  138

B. Neethi Simon is an academic researcher from Indian Institute of Technology Madras. The author has contributed to research in topics: Photoelasticity & Stress intensity factor. The author has an hindex of 4, co-authored 7 publications receiving 124 citations.

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Journal ArticleDOI

Digital photoelasticity – A comprehensive review

TL;DR: This review thematically classifies all the developments in digital photoelasticity and highlights the relative merits and drawbacks of the various techniques to allow an end-user to make an informed choice on the type of technique to be used in a particular situation.
Journal ArticleDOI

The influence of ambient illumination on colour adaptation in three fringe photoelasticity

TL;DR: It is brought out that a two-point colour adaptation scheme accounts not only for tint variation between the calibration and application specimens, but also for ambient illumination.
Journal ArticleDOI

Transient thermal stress intensity factors of bimaterial interface cracks using refined three-fringe photoelasticity

TL;DR: In this paper, a bimaterial specimen with interface edge cracks subjected to heating along an edge is analyzed by refined three-fringe photoelasticity (RTFP) combined with color adaptation.
Proceedings ArticleDOI

Effect of error in crack tip identification on the photoelastic evaluation of SIFs of interface cracks

TL;DR: In this article, the effect of error in precise identification of the crack tip on the evaluated SIFs was analyzed with the help of theoretically simulated fringe fields, in order to arrive at a technique by which the cracktip could be detected in a semiautomated fashion reducing this error in the evaluated stress intensity factors.