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B. Srinivasulu Naidu

Researcher at Sri Venkateswara University

Publications -  62
Citations -  1234

B. Srinivasulu Naidu is an academic researcher from Sri Venkateswara University. The author has contributed to research in topics: Thin film & Band gap. The author has an hindex of 17, co-authored 62 publications receiving 1180 citations.

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Spectroscopic characterization of electron-beam evaporated V2O5 thin films

TL;DR: In this paper, the chemical composition and structural and optical properties of thin films of vanadium pentoxide (V2O5) were investigated employing spectroscopic techniques, viz. X-ray photo-electron spectroscopy (XPS), inductively coupled plasma atomic emission spectrographs (ICP-AES), infrared spectrograms (IR), Raman spectrometers (RS), and optical spectro-graphs (OS).
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Preparation and characterization of CdO films deposited by dc magnetron reactive sputtering

TL;DR: In this article, the dc magnetron reactive sputtering of cadmium in an oxygen and argon atmosphere has been studied for their structural, electrical and optical properties, showing resistivity of 4.6×10−3 Ω cm, Hall mobility of 53 cm2/V s, carrier concentration of 3.5×1019 cm−3, with an optical transmission of 85% in the wavelength range 600-1600 nm and with a band gap of 2.46 eV.
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Physical Properties of Zinc Oxide Films Prepared by dc Reactive Magnetron Sputtering at Different Sputtering Pressures

TL;DR: In this article, the effect of sputtering pressure on the structural, electrical and optical properties of polycrystalline zinc oxide films was systematically studied and it was shown that the grain boundary scattering of the charge carriers is predominant in these films.
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Physical investigations on electron-beam evaporated vanadium pentoxide films

TL;DR: In this article, thin films of vanadium pentoxide were prepared by the electron-beam evaporation technique onto Corning 7059 glass and silicon substrates maintained at Ts=553 K by varying the oxygen partial pressure in the range of 20 mPa.
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Studies on dc magnetron sputtered cadmium oxide films

TL;DR: In this article, a dc reactive magnetron sputtering on glass substrates held at a fixed temperature of 623 K and at different oxygen partial pressures in 1×10 −4 −5× 10 −3 ǫmbar range was used to obtain thin films of cadmium oxide (CdO).