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Bai Xuan-Yu

Bio: Bai Xuan-Yu is an academic researcher from Xi'an Jiaotong University. The author has contributed to research in topics: Thin film & Sputter deposition. The author has an hindex of 1, co-authored 1 publications receiving 8 citations.

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TL;DR: In this paper, a strategy integrating discrete wavelet transform and fractal geometry concepts was developed for analyzing the anisotropy of surface structure of Cu-W thin films, and the results indicated that the agglomeration of thin films occurs primarily during annealing process.
Abstract: Cu–W films were deposited on Al 2 O 3 substrates by magnetron sputtering and then annealed in Ar gas at different temperatures for an hour. The evolution of surface morphology of the films during deposition and annealing was investigated by mathematical techniques. A strategy integrating discrete wavelet transform and fractal geometry concepts was developed for analyzing the anisotropy of surface structure of Cu–W thin films. The results indicated that the agglomeration of Cu–W thin films occurs primarily during annealing process. Based on the observation of positive correlation between the surface anisotropy and W-like phase transition, the relationship between the evolution of surface morphology of Cu–W thin films and the transition of phase structure was constructed. It was concluded that the changes of phase structures could have a significant impact on the anisotropy behavior of surface structure of Cu–W thin films.

10 citations


Cited by
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TL;DR: In this paper, the topography of the annealed ITO thin film has very definite, dominant and predictable roles in the evolution of fractal and superstructures acquired by atomic force microscopy (AFM).
Abstract: In this work it has been noticed that the topography of the annealed ITO thin film has very definite, dominant and predictable roles in the evolution of fractal and superstructures in ITO thin film topographies acquired by atomic force microscopy (AFM). It is found that, the spectral roughness of the films increases as the annealing temperature increases. The PSDs of all thin films exhibit inverse power law variation at the high spatial frequency region suggesting the existence of fractal components in the surface topographies. The fractal dimensions of the ITO film surfaces are in the range of 2.67–2.91.

83 citations

Journal ArticleDOI
TL;DR: In this paper, the effect of the substrate surface treating technique on the adhesive strength of Cu-W thin films was studied and it was found that the technique of ion beam assisting bombardment implanting of W particles can remarkably improve the adhesive property of the thin films and the critical load is doubled over than the sample only sputter-cleaned by ion beam.

10 citations

Journal ArticleDOI
TL;DR: Fractal analysis reveals the surface roughness of nanostructure surfaces is decreased after the annealing process, and a mathematical modeling method is described for the observation of the fractal dimension in semiconductor nanost structure films.

10 citations

Journal ArticleDOI
Yuan Wang, Z.X. Song1, Dayan Ma, X.Y. Wei, Kewei Xu 
TL;DR: The correlation between texture coefficient T110 and surface structure anisotropy of thin metal film is constructed with an approach of integrating the discrete wavelet transform and fractal geometry concepts.
Abstract: The correlation between texture coefficient T110 and surface structure anisotropy of thin metal film is constructed with an approach of integrating the discrete wavelet transform and fractal geometry concepts The research is based on experimental results of tungsten films of different thickness that were deposited on an Si (100) substrate by magnetron sputtering and then annealed in vacuum at 400 °C for 1 h The fact that there exists a definite relation between crystal orientation and surface morphology for the annealed W thin films suggests that the changes of film texture coefficient T110 depend on the competition between strain energy and surface energy This energy-depending evolution of surface structures of annealed W film is apparently a function of film's thickness

9 citations

Journal ArticleDOI
Lingyun Yang1, Yuanjun Shen1, S. T. Mi1, J.L. Fan1, H.R. Gong1 
TL;DR: In this paper, a new W-Cu potential has been established within the framework of the embedded-atom method (EAM) through the additional fitting of the structural energy differences between FCC and BCC structures of W and Cu.
Abstract: A new W–Cu potential has been established within the framework of the embedded-atom method (EAM) through the additional fitting of the structural energy differences between FCC and BCC structures of W and Cu. Based on this new potential, molecular dynamics simulations reveals that the lattice parameters of both BCC and FCC W–Cu solid solutions are bigger than those from the Vegard's law, and BCC and FCC W100-xCux solid solutions are thermodynamically more stable when 0 ≤ x ≤ 80 and 80

5 citations