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Boudewijn R de Jong

Bio: Boudewijn R de Jong is an academic researcher from University of Twente. The author has contributed to research in topics: Fabrication & Precision engineering. The author has an hindex of 1, co-authored 1 publications receiving 30 citations.

Papers
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TL;DR: In this article, a planar three-degrees-of-freedom parallel kinematic manipulator was fabricated with a simple two-mask process in conventional highly doped single-crystalline silicon (SCS) wafers.
Abstract: -This paper presents the design, modeling, and fabrication of a planar three-degrees-of-freedom parallel kinematic manipulator, fabricated with a simple two-mask process in conventional highly doped single-crystalline silicon (SCS) wafers (100). The manipulator's purpose is to provide accurate and stable positioning of a small sample (10 × 20 × 0.2 μm3), e.g., within a transmission electron microscope. The manipulator design is based on the principles of exact constraint design, resulting in a high actuation-compliance combined with a relatively high suspension stiffness. A modal analysis shows that the fourth vibration mode frequency is at least a factor 11 higher than the first three actuation-related mode frequencies. The comb-drive actuators are modeled in combination with the shuttle suspensions gaining insight into the side and rotational pull-in stability conditions. The two-mask fabrication process enables high-aspect-ratio structures, combined with electrical trench insulation. Trench insulation allows structures in conventional wafers to be mechanically connected while being electrically insulated from each other. Device characterization shows high linearity of displacement wrt voltage squared over ±10 μm stroke in the xand y-directions and ±2° rotation at a maximum of 50 V driving voltage. Out-of-plane displacement crosstalk due to in-plane actuation in resonance is measured to be less than 20 pm. The hysteresis in SCS, measured using white light interferometry, is shown to be extremely small.

31 citations


Cited by
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TL;DR: A new analysis tool is presented which predicts the dynamic force and torque distribution on the magnet array, which offers a fast and accurate solution for the analysis of magnetically levitated planar actuators.
Abstract: This paper concerns the analysis of the dynamic forces and torques acting on the magnets in a Halbach permanent magnet array of a magnetically levitated moving-magnet planar actuator. A new analysis tool is presented which predicts the dynamic force and torque distribution on the magnet array. This design tool uses lookup table data, which are generated by numerically solving the Lorentz force and torque integral, to describe the force and torque between each magnet and coil in the topology. It offers a fast and accurate solution for the analysis of magnetically levitated planar actuators. The results for two different commutation methods are presented.

83 citations

Journal ArticleDOI
TL;DR: In this article, an optimal approach of selecting 16 key parameters of a planar parallel 3-DOF nanopositioner is presented. But the tradeoff of multiple performance evaluation indexes is an important factor needing to be considered in the process of designing a nanopositioners.

74 citations

Journal ArticleDOI
TL;DR: Two parameters optimization approaches are helpful to enhance the performance of a planar parallel 3-DOF nanopositioning system using a multiobjective particle swarm optimization algorithm.
Abstract: Planar parallel three-degrees-of-freedom (3-DOF) nanopositioning systems have been widely applied in scanning probe microscopy, micro-/nanomanipulation, nanoimprint lithography, and precision machining. Two effective optimization approaches are proposed to enhance the system performance in this paper. First, seven indexes are involved in modeling a nanopositioning platform to evaluate the mechanism performance. Four constraints are also considered. A general analysis, optimization, and decision-making method to select better structure parameters is presented. Prototype test results demonstrate high accuracy of the proposed modeling approach and efficiency of the optimization method. Second, precision, accuracy, and velocity are three main indexes to evaluate a nanopositioning system. Different simulated loads are added to test the system performance. Servocontrol parameters of both three input ports and the end effector are optimized using a multiobjective particle swarm optimization algorithm. Experimental results validate the performance of the optimization module and selected parameters. Two parameters optimization approaches are helpful to enhance the performance of a planar parallel 3-DOF nanopositioning system.

69 citations

Journal ArticleDOI
TL;DR: In this paper, a planar three-degrees-of-freedom (3-DOF) nanopositioning platform is described in which three two-level lever amplifiers are arranged symmetrically to achieve large magnification.
Abstract: Piezo-actuated flexure-based precision positioning platforms have been widely used in micro/nano manipulation. A conventional major challenge is the trade-off between high rigidity, large magnification, high-precision tracking, and high-accuracy positioning. A compact planar three-degrees-of-freedom (3-DOF) nanopositioning platform is described in which three two-level lever amplifiers are arranged symmetrically to achieve large magnification. The parallel-kinematic configuration with optimised sizes increases the rigidity. Displacement loss models (DLM) are proposed for the external preload port of the actuator, the input port of the platform and the flexible lever mechanism. The kinematic and dynamic modelling accuracies are improved by the compensation afforded by the three DLMs. Experimental results validate the proposed design and modelling methods. The proposed platform possesses high rigidity, large magnification, high-precision circle tracking and high-accuracy positioning.

61 citations

Journal ArticleDOI
TL;DR: In this article, a shape-memory-alloy (SMA) micromanipulator with gripping mechanism is presented, which is able to move in the x and y-axis by 7.1 mm and 5.2 mm, respectively, resulting in a maximum displacement of 8.9 mm.

56 citations