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Brian T. Schwartz

Bio: Brian T. Schwartz is an academic researcher from University of Colorado Boulder. The author has contributed to research in topics: Electron cooling & Refractive index. The author has an hindex of 8, co-authored 30 publications receiving 815 citations.

Papers
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Journal ArticleDOI
07 Nov 2013-Nature
TL;DR: The results set the stage for the development of future multi-staged DLA devices composed of integrated on-chip systems, and would substantially reduce the size and cost of a future collider on the multi-TeV (1012 eV) scale.
Abstract: Acceleration of relativistic electrons in a dielectric laser accelerator at high electric field gradients is reported, setting the stage for the development of future multi-staged accelerators of this type. Conventional particle accelerators, based on radio-frequency technology, are large-scale installations that are expensive to run. Micro-fabricated dielectric laser accelerators (DLAs) offer an attractive alternative, as they are able to support much larger accelerating fields than current accelerators, while being compact, economical and simple to manufacture using lithographic techniques. This paper presents the first experimental demonstration of a DLA capable of sustained, high-gradient (beyond 250 MeV m−1) acceleration of relativistic electrons. The results set the stage for the development of future multi-staged DLA devices composed of integrated on-chip systems, which would enable compact table-top MeV–GeV-scale accelerators. Applications include security scanners and medical therapy, X-ray light sources for biological and materials research, and portable medical imaging devices. The enormous size and cost of current state-of-the-art accelerators based on conventional radio-frequency technology has spawned great interest in the development of new acceleration concepts that are more compact and economical. Micro-fabricated dielectric laser accelerators (DLAs) are an attractive approach, because such dielectric microstructures can support accelerating fields one to two orders of magnitude higher than can radio-frequency cavity-based accelerators. DLAs use commercial lasers as a power source, which are smaller and less expensive than the radio-frequency klystrons that power today’s accelerators. In addition, DLAs are fabricated via low-cost, lithographic techniques that can be used for mass production. However, despite several DLA structures having been proposed recently1,2,3,4, no successful demonstration of acceleration in these structures has so far been shown. Here we report high-gradient (beyond 250 MeV m−1) acceleration of electrons in a DLA. Relativistic (60-MeV) electrons are energy-modulated over 563 ± 104 optical periods of a fused silica grating structure, powered by a 800-nm-wavelength mode-locked Ti:sapphire laser. The observed results are in agreement with analytical models and electrodynamic simulations. By comparison, conventional modern linear accelerators operate at gradients of 10–30 MeV m−1, and the first linear radio-frequency cavity accelerator was ten radio-frequency periods (one metre) long with a gradient of approximately 1.6 MeV m−1 (ref. 5). Our results set the stage for the development of future multi-staged DLA devices composed of integrated on-chip systems. This would enable compact table-top accelerators on the MeV–GeV (106–109 eV) scale for security scanners and medical therapy, university-scale X-ray light sources for biological and materials research, and portable medical imaging devices, and would substantially reduce the size and cost of a future collider on the multi-TeV (1012 eV) scale.

437 citations

Journal ArticleDOI
TL;DR: In this article, the effect of total external reflection on metal-dielectric nanostructures is investigated when light from vacuum is incident onto these materials at an angle exceeding the critical angle defined by Snell's law.
Abstract: Metamaterials composed of metal-dielectric nanostructures are engineered to have an effective refractive index less than unity at optical wavelengths. The effect of total external reflection is demonstrated when light from vacuum is incident onto these materials at an angle exceeding the critical angle defined by Snell’s law. Novel approaches are discussed to derive the effective index of refraction from the reflection and refraction properties of finite slabs. The effect of losses and dispersion are analyzed in the visible range of frequencies by consideration of the measured properties of silver. The differences among ultralow refractive-index metamaterials, photonic bandgap materials, and metals are discussed. Remarkably, a bandgap is not required to obtain total external reflection.

120 citations

Journal ArticleDOI
TL;DR: In this paper, a slab waveguide structure that guides visible light in an air core was designed and analyzed using metal-dielectric nanostructures, which showed intriguing optical properties including total external reflection.
Abstract: Metamaterials composed of metal-dielectric nanostructures can be engineered to have the real part of the effective refractive index less than unity at optical wavelengths. These materials show intriguing optical properties including total external reflection. We utilize this effect to design and analyze slab waveguide structures that guide visible light in an air core.

93 citations

Journal ArticleDOI
TL;DR: The paper first presents a model predicting the system-level effects of thermal and process variation in nanophotonic networks, and shows how to optimize many-core system performance and reliability by using run-time techniques to compensate for the thermal andprocess variation effects.
Abstract: While transistor performance and energy efficiency have dramatically improved in recent years, electrical interconnect improvements has failed to keep pace. Recent advances in nanophotonic fabrication have made on-chip optics an attractive alternative. However, system integration challenges remain. In particular, the parameters of on-chip nanophotonic structures are sensitive to fabrication-induced process variation and run-time spatial thermal variation across the die. This work addresses the performance and reliability challenges that arise from this sensitivity to variation. The paper first presents a model predicting the system-level effects of thermal and process variation in nanophotonic networks. It then shows how to optimize many-core system performance and reliability by using run-time techniques to compensate for the thermal and process variation effects.

89 citations

Journal ArticleDOI
TL;DR: Aluminum oxide (Al2O3) atomic layer deposition (ALD) on synthetic opal was explored as a model system to understand the growth of ALD films on photonic crystals as discussed by the authors.
Abstract: Aluminum oxide (Al2O3) atomic layer deposition (ALD) on synthetic opal was explored as a model system to understand the growth of ALD films on photonic crystals. Al2O3 ALD was used to coat the sili...

34 citations


Cited by
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Journal ArticleDOI

4,756 citations

Proceedings Article
01 Jan 1999
TL;DR: In this paper, the authors describe photonic crystals as the analogy between electron waves in crystals and the light waves in artificial periodic dielectric structures, and the interest in periodic structures has been stimulated by the fast development of semiconductor technology that now allows the fabrication of artificial structures, whose period is comparable with the wavelength of light in the visible and infrared ranges.
Abstract: The term photonic crystals appears because of the analogy between electron waves in crystals and the light waves in artificial periodic dielectric structures. During the recent years the investigation of one-, two-and three-dimensional periodic structures has attracted a widespread attention of the world optics community because of great potentiality of such structures in advanced applied optical fields. The interest in periodic structures has been stimulated by the fast development of semiconductor technology that now allows the fabrication of artificial structures, whose period is comparable with the wavelength of light in the visible and infrared ranges.

2,722 citations

Journal ArticleDOI
TL;DR: This work presents the design of a non-magnetic cloak operating at optical frequencies, and the principle and structure of the proposed cylindrical cloak are analysed and the general recipe for the implementation of such a device is provided.
Abstract: Artificially structured metamaterials have enabled unprecedented flexibility in manipulating electromagnetic waves and producing new functionalities, including the cloak of invisibility based on coordinate transformation1,2,3. Unlike other cloaking approaches4,5,6, which are typically limited to subwavelength objects, the transformation method allows the design of cloaking devices that render a macroscopic object invisible. In addition, the design is not sensitive to the object that is being cloaked. The first experimental demonstration of such a cloak at microwave frequencies was recently reported7. We note, however, that that design7 cannot be implemented for an optical cloak, which is certainly of particular interest because optical frequencies are where the word ‘invisibility’ is conventionally defined. Here we present the design of a non-magnetic cloak operating at optical frequencies. The principle and structure of the proposed cylindrical cloak are analysed, and the general recipe for the implementation of such a device is provided.

1,953 citations

01 Sep 1994
TL;DR: In this article, the authors present a review of Charged Particle Dynamics and Focusing Systems without Space Charge, including Linear Beam Optics with Space Charge and Self-Consistent Theory of Beams.
Abstract: Review of Charged Particle Dynamics. Beam Optics and Focusing Systems Without Space Charge. Linear Beam Optics with Space Charge. Self-Consistent Theory of Beams. Emittance Variation. Beam Physics Research from 1993 to 2007. Appendices. List of Frequently Used Symbols. Bibliography. Index.

1,311 citations

Journal ArticleDOI
TL;DR: Puurunen et al. as discussed by the authors summarized the two-reactant ALD processes to grow inorganic materials developed to-date, updating the information of an earlier review on ALD.
Abstract: Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely suitable for depositing uniform and conformal films on complex three-dimensional topographies. The deposition of a film of a given material by ALD relies on the successive, separated, and self-terminating gas–solid reactions of typically two gaseous reactants. Hundreds of ALD chemistries have been found for depositing a variety of materials during the past decades, mostly for inorganic materials but lately also for organic and inorganic–organic hybrid compounds. One factor that often dictates the properties of ALD films in actual applications is the crystallinity of the grown film: Is the material amorphous or, if it is crystalline, which phase(s) is (are) present. In this thematic review, we first describe the basics of ALD, summarize the two-reactant ALD processes to grow inorganic materials developed to-date, updating the information of an earlier review on ALD [R. L. Puurunen, J. Appl. Phys. 97, 121301 (2005)], and give an overview of the status of processing ternary compounds by ALD. We then proceed to analyze the published experimental data for information on the crystallinity and phase of inorganic materials deposited by ALD from different reactants at different temperatures. The data are collected for films in their as-deposited state and tabulated for easy reference. Case studies are presented to illustrate the effect of different process parameters on crystallinity for representative materials: aluminium oxide, zirconium oxide, zinc oxide, titanium nitride, zinc zulfide, and ruthenium. Finally, we discuss the general trends in the development of film crystallinity as function of ALD process parameters. The authors hope that this review will help newcomers to ALD to familiarize themselves with the complex world of crystalline ALD films and, at the same time, serve for the expert as a handbook-type reference source on ALD processes and film crystallinity.

1,160 citations