Author
C-H. Lin
Other affiliations: GlobalFoundries
Bio: C-H. Lin is an academic researcher from IBM. The author has contributed to research in topics: CMOS & Dram. The author has an hindex of 8, co-authored 9 publications receiving 442 citations. Previous affiliations of C-H. Lin include GlobalFoundries.
Topics: CMOS, Dram, Copper interconnect, Logic gate, Thermal resistance
Papers
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01 Dec 2009
TL;DR: FinFET integration challenges and solutions are discussed for the 22 nm node and beyond and Diamond-shaped epi growth for the raised source-drain is proposed to improve parasitic resistance degraded by 3-D structure with thin Si-body.
Abstract: FinFET integration challenges and solutions are discussed for the 22 nm node and beyond. Fin dimension scaling is presented and the importance of the sidewall image transfer (SIT) technique is addressed. Diamond-shaped epi growth for the raised source-drain (RSD) is proposed to improve parasitic resistance (R para ) degraded by 3-D structure with thin Si-body. The issue of V t -mismatch is discussed for continuous FinFET SRAM cell-size scaling.
143 citations
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IBM1
TL;DR: In this article, the authors present a fully integrated 14nm CMOS technology featuring fin-FET architecture on an SOI substrate for a diverse set of SoC applications including HP server microprocessors and LP ASICs.
Abstract: We present a fully integrated 14nm CMOS technology featuring finFET architecture on an SOI substrate for a diverse set of SoC applications including HP server microprocessors and LP ASICs. This SOI finFET architecture is integrated with a 4th generation deep trench embedded DRAM to provide an ultra-dense (0.0174um2) memory solution for industry leading ‘scale-out’ processor design. A broad range of Vts is enabled on chip through a unique dual workfunction process applied to both NFETs and PFETs. This enables simultaneous optimization of both lowVt (HP) and HiVt (LP) devices without reliance on problematic approaches like heavy doping or Lgate modulation to create Vt differentiation. The SOI finFET's excellent subthreshold behavior allows gate length scaling to the sub 20nm regime and superior low Vdd operation. This leads to a substantial (>35%) performance gain for Vdd ∼0.8V compared to the HP 22nm planar predecessor technology. At the same time, the exceptional FE/BE reliability enables high Vdd (>1.1V) operation essential to the high single thread performance for processors intended for ‘scale-up’ enterprise systems. A hierarchical BEOL with 15 levels of copper interconnect delivers both high performance wire-ability as well as effective power supply and clock distribution for very large >600mm2 SoCs.
137 citations
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IBM1
TL;DR: A hierarchical BEOL with 15 levels of copper interconnect including self-aligned via processing delivers high performance with exceptional reliability in SOI CMOS 22nm technology.
Abstract: We present a fully-integrated SOI CMOS 22nm technology for a diverse array of high-performance applications including server microprocessors, memory controllers and ASICs. A pre-doped substrate enables scaling of this third generation of SOI deep-trench-based embedded DRAM for a dense high-performance memory hierarchy. Dual-Embedded stressor technology including SiGe and Si:C for improved carrier mobility in both PMOS and NMOS FETs is presented for the first time. A hierarchical BEOL with 15 levels of copper interconnect including self-aligned via processing delivers high performance with exceptional reliability.
92 citations
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01 Dec 2017
TL;DR: A fully integrated 7nm CMOS platform featuring a 3rd generation finFET architecture, SAQP for fin formation, and SADP for BEOL metallization, designed to enable both High Performance Compute (HPC) and mobile applications.
Abstract: We present a fully integrated 7nm CMOS platform featuring a 3rd generation finFET architecture, SAQP for fin formation, and SADP for BEOL metallization. This technology reflects an improvement of 2.8X routed logic density and >40% performance over the 14nm reference technology described in [1-3]. A full range of Vts is enabled on-chip through a unique multi-workfunction process. This enables both excellent low voltage SRAM response and highly scaled memory area simultaneously. The HD 6-T bitcell size is 0.0269um2. This 7nm technology is fully enabled by immersion lithography and advanced optical patterning techniques (like SAQP and SADP). However, the technology platform is also designed to leverage EUV insertion for specific multi-patterned (MP) levels for cycle time benefit and manufacturing efficiency. A complete set of foundation and complex IP is available in this advanced CMOS platform to enable both High Performance Compute (HPC) and mobile applications.
50 citations
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14 Jun 2016TL;DR: In this article, the transition to Ti-based silicides for source-drain (SD) contacts for 3D FinFET devices starting from the 14nm node and beyond is discussed.
Abstract: We discuss the transition to Ti based silicides for source-drain (SD) contacts for 3D FinFET devices starting from the 14nm node & beyond. Reductions in n-FET & p-FET contact resistances are reported with the optimization of metallization process & dopant concentrations. The optimization of SiGe epitaxy and addition of a thin interfacial NiPt(10%) are found to significantly improve p-FET contact performance.
27 citations
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TL;DR: Transistor architectures such as extremely thin silicon-on-insulator and FinFET (and related architecture such as TriGate, Omega-FET, Pi-Gate), as well as nanowire device architectures, are compared and contrasted.
Abstract: This review paper explores considerations for ultimate CMOS transistor scaling Transistor architectures such as extremely thin silicon-on-insulator and FinFET (and related architectures such as TriGate, Omega-FET, Pi-Gate), as well as nanowire device architectures, are compared and contrasted Key technology challenges (such as advanced gate stacks, mobility, resistance, and capacitance) shared by all of the architectures will be discussed in relation to recent research results
558 citations
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TL;DR: This paper presents Ramulator, a fast and cycle-accurate DRAM simulator that is built from the ground up for extensibility, and is able to provide out-of-the-box support for a wide array of DRAM standards.
Abstract: Recently, both industry and academia have proposed many different roadmaps for the future of DRAM. Consequently, there is a growing need for an extensible DRAM simulator, which can be easily modified to judge the merits of today's DRAM standards as well as those of tomorrow. In this paper, we present Ramulator , a fast and cycle-accurate DRAM simulator that is built from the ground up for extensibility. Unlike existing simulators, Ramulator is based on a generalized template for modeling a DRAM system, which is only later infused with the specific details of a DRAM standard. Thanks to such a decoupled and modular design, Ramulator is able to provide out-of-the-box support for a wide array of DRAM standards: DDR3/4, LPDDR3/4, GDDR5, WIO1/2, HBM, as well as some academic proposals (SALP, AL-DRAM, TL-DRAM, RowClone, and SARP). Importantly, Ramulator does not sacrifice simulation speed to gain extensibility: according to our evaluations, Ramulator is 2.5 $\times$ faster than the next fastest simulator. Ramulator is released under the permissive BSD license.
535 citations
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TL;DR: The importance of process variation in modern transistor technology is discussed, front-end variation sources are reviewed, device and circuit variation measurement techniques are presented, and recent intrinsic transistor variation performance from the literature is compared.
Abstract: Moore's law technology scaling has improved performance by five orders of magnitude in the last four decades. As advanced technologies continue the pursuit of Moore's law, a variety of challenges will need to be overcome. One of these challenges is the management of process variation. This paper discusses the importance of process variation in modern transistor technology, reviews front-end variation sources, presents device and circuit variation measurement techniques, including circuit and memory data from the 32-nm node, and compares recent intrinsic transistor variation performance from the literature.
350 citations
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TL;DR: A high density, low-power standard cell architecture, developed using design/technology co-optimization (DTCO), as well as example SRAM cells are shown, and the PDK transistor electrical assumptions are explained, as are the FEOL and BEOL design rules.
326 citations
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TL;DR: The outlook and the challenges of quantum-engineered transistors using heterostructures of two-dimensional materials against the benchmark of silicon technology and its foreseeable evolution in terms of potential performance and manufacturability are analyzed.
Abstract: Quantum engineering entails atom-by-atom design and fabrication of electronic devices. This innovative technology that unifies materials science and device engineering has been fostered by the recent progress in the fabrication of vertical and lateral heterostructures of two-dimensional materials and by the assessment of the technology potential via computational nanotechnology. But how close are we to the possibility of the practical realization of next-generation atomically thin transistors? In this Perspective, we analyse the outlook and the challenges of quantum-engineered transistors using heterostructures of two-dimensional materials against the benchmark of silicon technology and its foreseeable evolution in terms of potential performance and manufacturability. Transistors based on lateral heterostructures emerge as the most promising option from a performance point of view, even if heterostructure formation and control are in the initial technology development stage.
279 citations