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Chandra Mouli

Researcher at Micron Technology

Publications -  216
Citations -  3356

Chandra Mouli is an academic researcher from Micron Technology. The author has contributed to research in topics: Transistor & Field-effect transistor. The author has an hindex of 32, co-authored 216 publications receiving 3289 citations. Previous affiliations of Chandra Mouli include Aptina.

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Semiconductor-on-insulator constructions; and methods of forming semiconductor-on-insulator constructions

Chandra Mouli
TL;DR: In this paper, a method of forming a semiconductor-on-insulator construction is described, in which a substrate is provided, and a band of material is formed within the band by one or more of nitrogen argon, fluorine, bromine, chlorine, iodine and germanium.
Patent

FinFET device with reduced DIBL

TL;DR: In this paper, the authors present a method for producing a retrograde dopant profile extending towards the channel region of a FinFET wafer, which can be selectively applied to selected portions of a wafer to tailor device characteristics, such as for memory cells.
Patent

Process for making a silicon-on-insulator ledge by implanting ions from silicon source

TL;DR: In this article, a process of making a partial silicon-on-insulator ledge is described, where a deep implantation region is created in a substrate, and an active device is achieved by the process.
Patent

Semiconductor packages, methods of forming semiconductor packages, and methods of cooling semiconductor dies

TL;DR: In this article, the authors present a method for cooling a semiconductor die in which coolant is forced through grooves in a backside of the die, and includes methods of making semiconductor packages utilizing carbon nanostructures (such as carbon nanotubes) as thermally conductive interface materials.
Patent

Transparent conductor based pinned photodiode

TL;DR: In this article, a gate oxide is formed over a doped, buried region in a semiconductor substrate, and a transparent conductor is formed on top of the gate oxide, which can be biased to reduce the need for a surface dopant in creating a pinned photodiode region.