C
Chandra Mouli
Researcher at Micron Technology
Publications - 216
Citations - 3356
Chandra Mouli is an academic researcher from Micron Technology. The author has contributed to research in topics: Transistor & Field-effect transistor. The author has an hindex of 32, co-authored 216 publications receiving 3289 citations. Previous affiliations of Chandra Mouli include Aptina.
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Patent
Methods of forming semiconductor structures including a movable switching element
Gurtej S. Sandhu,Chandra Mouli +1 more
TL;DR: In this paper, a movable switching element has a base disposed on a conductive pad, a body extending from the base, and an end laterally adjacent and spaced apart from the conductive contact.
Patent
Method for fabricating stacked non-volatile memory with silicon carbide-based amorphous silicon thin film transistors
TL;DR: In this article, a stacked nonvolatile memory device using amorphous silicon based thin film transistors stacked vertically is described, where each layer is formed from a deposited a-Si channel region layer having a predetermined concentration of carbon to form a carbon rich silicon film or silicon carbide film, depending on the carbon content.
Patent
Capacitor-less floating-body volatile memory cell comprising a pass transistor and a vertical read/write enable transistor and manufacturing and programming methods thereof
Fernando Gonzalez,Chandra Mouli +1 more
TL;DR: In this paper, a capacitor-less floating-body memory cell, memory device, system and process of forming the capacitorless memory cell includes forming the memory cell in an active area of a substantially physically isolated portion of the bulk semiconductor substrate.
Patent
Memory devices including vertical memory cells and related methods
TL;DR: In this paper, a bottom-plug material was used to form a bottom plug material within vertical channels and forming such a channel material electrically coupled to the bottom-pump material.
Book ChapterDOI
Three-Dimensional Characterization and Modeling of Stress Distribution in High-Density DRAM Memory Cells
TL;DR: In this paper, a 3D analysis of the stress distribution in and around the active area of high-density memory cells is presented using a combination of high resolution metrology analysis and 3D numerical modeling.