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Chenming Hu
Researcher at University of California, Berkeley
Publications - 1300
Citations - 60963
Chenming Hu is an academic researcher from University of California, Berkeley. The author has contributed to research in topics: MOSFET & Gate oxide. The author has an hindex of 119, co-authored 1296 publications receiving 57264 citations. Previous affiliations of Chenming Hu include Motorola & National Chiao Tung University.
Papers
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Proceedings ArticleDOI
On-state reliability of amorphous silicon antifuses
TL;DR: In this paper, a unified model of the on-state reliability of a-Si antifuses is presented, which accounts for both thermal activation and electromigration, and it is shown that to ensure a 10-year lifetime, the antifuse should be operated at a current value less than 60% of its programming current value.
Proceedings Article
Channel Width Dependence of Hot-Carrier Induced Degradation in Shallow Trench Isolated pMOSFETs
TL;DR: In this article, the authors investigated the channel width dependence of the hot-carrier in-duced degradation in pMOSFETs with shallow trench isolation structure and showed that the narrow width device shows large electron trapping efficiency of the gate oxide film though the gate current is smaller than the wide width device.
Proceedings ArticleDOI
Electron wavefunction penetration into gate dielectric and interface scattering-an alternative to surface roughness scattering model
I. Polishchuk,Chenming Hu +1 more
TL;DR: In this paper, the authors used a QM simulator to determine the amount of carrier wavefunction penetration into gate dielectric, which affects the inversion charge density Q/sub inv/inversion charge centroid, and most importantly carrier mobility.
Journal ArticleDOI
Electromigration characteristics of tungsten plug vias under pulse and bidirectional current stressing
TL;DR: In this paper, the performance of selective CVD tungsten filled vias under DC, pulsed DC, and AC current signals has been studied using Kelvin test structures, and the via electromigration lifetime exhibits a current polarity dependence.
Proceedings Article
Characterization and modeling of a highly reliable metal-to-metal antifuse for high-performance and high-density field-programmable gate arrays
Chih Ching Shih,Roy Lambertson,Frank Hawley,Farid Issaq,John L. McCollum,Esmat Z. Hamdy,Hiroshi Sakurai,Hiroshi Yuasa,Hirotsugu Honda,Tohru Yamaoka,Tetsuaki Wada,Chenming Hu +11 more