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Chenming Hu
Researcher at University of California, Berkeley
Publications - 1300
Citations - 60963
Chenming Hu is an academic researcher from University of California, Berkeley. The author has contributed to research in topics: MOSFET & Gate oxide. The author has an hindex of 119, co-authored 1296 publications receiving 57264 citations. Previous affiliations of Chenming Hu include Motorola & National Chiao Tung University.
Papers
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Journal ArticleDOI
Modeling of Advanced RF Bulk FinFETs
Pragya Kushwaha,Harshit Agarwal,Yen-Kai Lin,Ming-Yen Kao,Juan Pablo Duarte,Huan-Lin Chang,W. Wong,J. Fan,Xiayu,Yogesh Singh Chauhan,Sayeef Salahuddin,Chenming Hu +11 more
TL;DR: In this article, the Berkeley short-channel IGFET model-common multi-gate model is improved to account for the impact of substrate coupling on the RF parameters, and the model demonstrates excellent agreement with the measured data over a broad range of frequencies.
Proceedings ArticleDOI
Saturation velocity and velocity overshoot of inversion layer electrons and holes
TL;DR: In this article, the effect of a wide range of parameters on the high-field transport of inversion layer electrons and holes was studied. But the authors only considered the high field transport of electron and hole.
Proceedings ArticleDOI
Accurate in-situ measurement of peak noise and signal delay induced by interconnect coupling
TL;DR: In this paper, an accurate in-situ noise and delay measurement technique is developed and a test chip is fabricated to demonstrate its efficacy, which can experimentally characterize the noise peak height and the timing skew due to noise.
Proceedings ArticleDOI
MOSFET Degradation due to stressing of thin oxide
TL;DR: In this article, Fowler-Nordheim tunneling current has been investigated using capacitor C-V, I-V and transistor IV measurements, and the interface traps caused degradations in subthreshold current slope and surface mobility.
Journal ArticleDOI
Modeling of small size MOSFETs with reverse short channel and narrow width effects for circuit simulation
TL;DR: In this paper, a model of small size MOSFETs and experimental verification of the model using devices with varying pocket implant processes is presented, which can well describe reverse short channel and narrow width effects and match the measured characteristics of threshold voltage and saturation current over a wide range of channel lengths and widths down to 0.12 μm regime.