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Christian Wenger

Researcher at Leibniz Institute for Neurobiology

Publications -  148
Citations -  2579

Christian Wenger is an academic researcher from Leibniz Institute for Neurobiology. The author has contributed to research in topics: Resistive random-access memory & Dielectric. The author has an hindex of 21, co-authored 139 publications receiving 1820 citations. Previous affiliations of Christian Wenger include Leibniz Association & Innovations for High Performance Microelectronics.

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Residual Metallic Contamination of Transferred Chemical Vapor Deposited Graphene

TL;DR: Graphene layers grown on copper foils by chemical vapor deposition and transferred to silicon wafers by wet etching and electrochemical delamination methods with respect to residual submonolayer metallic contaminations are investigated.
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Model for the Resistive Switching Effect in $ \hbox{HfO}_{2}$ MIM Structures Based on the Transmission Properties of Narrow Constrictions

TL;DR: In this paper, a physics-based analytical model for the currentvoltage characteristics corresponding to the low and high resistive states in electroformed metal-insulator-metal structures with HfO2 layers is proposed.
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Filament Growth and Resistive Switching in Hafnium Oxide Memristive Devices.

TL;DR: A resistive switching model for the TiN/Ti/HfO2/TiN memristive devices is proposed, taking into account important experimental and theoretical findings, and the model is validated using 2D and 3D kinetic Monte Carlo simulation models.
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Control of Switching Modes and Conductance Quantization in Oxygen Engineered HfOx based Memristive Devices

TL;DR: In this article, a well-controlled oxygen stoichiometry was found to be the key factor in manipulating the balance between electric field and Joule heating during formation, rupture (reset), and reformation (set) of conductive filaments in the dielectric.
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Strain analysis in SiN/Ge microstructures obtained via Si-complementary metal oxide semiconductor compatible approach

TL;DR: In this paper, the tensile strain distribution and photoluminescence in Ge microstructures fabricated by means of a Si-CMOS compatible method was analyzed using a SiN stressor layer.