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Chunsheng Lu

Researcher at Curtin University

Publications -  197
Citations -  4203

Chunsheng Lu is an academic researcher from Curtin University. The author has contributed to research in topics: Piezoelectricity & Weibull distribution. The author has an hindex of 30, co-authored 169 publications receiving 3187 citations. Previous affiliations of Chunsheng Lu include University of Sydney & University of Western Australia.

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Advances in oxidation and ablation resistance of high and ultra-high temperature ceramics modified or coated carbon/carbon composites

TL;DR: In this paper, the authors reviewed the recent advances in oxidation and ablation resistance of carbon/carbon composites and highlighted some open problems and future challenges in the development and application of these materials.
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Influence of aspect ratio on barrier properties of polymer-clay nanocomposites.

TL;DR: The results show that the aspect ratio of exfoliated silicate platelets has a critical role in controlling the microstructure of polymer-clay nanocomposites and their barrier properties.
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Fracture statistics of brittle materials: Weibull or normal distribution.

TL;DR: The fit of fracture strength data of brittle materials to the Weibull and normal distributions is compared in terms of the Akaike information criterion and the uncritical use of the WeIBull distribution for strength data is questioned.
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Determination of interfacial adhesion energies of thermal barrier coatings by compression test combined with a cohesive zone finite element model

TL;DR: In this article, a combined compression test with a cohesive zone finite element model was used to determine the interfacial adhesion energy of thermal barrier coatings, and it was shown that the critical interfacial energy of delamination is 120 −J/m 2 and the corresponding loading phase angle is −56°.
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On the intrinsic hardness of a metallic film/substrate system: Indentation size and substrate effects

TL;DR: In this article, a simple model is proposed to predict the intrinsic hardness of thin films, which allows a more accurate fitting to empirical data and the estimation of ultimate film hardness, which can be used to interpret indentation data and extrapolate the indentation depth-hardness curve to an important region where indentation depths lie between 1% to 5 times of film thickness.