C
Claes H. Bjorkman
Researcher at Applied Materials
Publications - 31
Citations - 1772
Claes H. Bjorkman is an academic researcher from Applied Materials. The author has contributed to research in topics: Etching (microfabrication) & Substrate (printing). The author has an hindex of 18, co-authored 31 publications receiving 1768 citations.
Papers
More filters
Patent
Integrated low k dielectrics and etch stops
Claes H. Bjorkman,Yu Melissa Min,Hongquing Shan,David Cheung,Wai-Fan Yau,Kuo-Wei Liu,Nasreen Gazala Chopra,Gerald Zheyao Yin,Farhad Moghadam,Judy H. Huang,Dennis J. Yost,Betty Tang,Yunsang Kim +12 more
TL;DR: In this paper, a method of depositing and etching dielectric layers has been proposed for the formation of horizontal interconnects by varying the concentration of a carbon:oxygen gas such as carbon monoxide.
Patent
Etch method using a dielectric etch chamber with expanded process window
Jingbao Liu,Judy Wang,Takehiko Komatsu,Bryan Pu,Kenny L. Doan,Claes H. Bjorkman,Melody Chang,Yunsang Kim,Hongching Shan,Ruiping Wang +9 more
TL;DR: In this paper, a method for etching a dielectric in a thermally controlled plasma etch chamber with an expanded processing window is presented, adapted to incorporate benefits of the thermal control and high evacuation capability of the chamber.
Patent
Dielectric etch chamber with expanded process window
James D. Carducci,Hamid Noorbakhsh,Evans Lee,Bryan Pu,Hongching Shan,Claes H. Bjorkman,Siamak Salimian,Paul E. Luscher,Michael D. Welch +8 more
TL;DR: A capacitively coupled reactor for plasma etch processing of substrates at sub-mospheric pressures is described in this paper, where a chamber body defining a processing volume, a lid provided upon the chamber body, the lid being a first electrode, substrate support provided in the processing volume and comprising a second electrode, a radio frequency source coupled at least to one of the first and second electrodes, and an evacuation pump system having pumping capacity of at least 1600 liters/minute The greater pumping capacity controls residency time of the process gases so as to regulate the degree of dissociation into
Patent
High selectivity etch using an external plasma discharge
TL;DR: In this paper, an apparatus and method for scavenging etchant species from a plasma formed of etchant gas prior to the etchant gases entering a primary processing chamber of a plasma reactor is described.
Patent
Optical ready substrates
TL;DR: An article of manufacture comprising an optical-ready substrate made of a first semiconductor layer, an insulating layer on top of the first semiconducting layer, and an optical signal distribution circuit made up of interconnected semiconductor photonic elements and designed to provide signals to the microelectronic circuit was described in this article.