This paper introduces McPAT, an integrated power, area, and timing modeling framework that supports comprehensive design space exploration for multicore and manycore processor configurations ranging from 90nm to 22nm and beyond. At the microarchitectural level, McPAT includes models for the fundamental components of a chip multiprocessor, including in-order and out-of-order processor cores, networks-on-chip, shared caches, integrated memory controllers, and multiple-domain clocking. At the circuit and technology levels, McPAT supports critical-path timing modeling, area modeling, and dynamic, short-circuit, and leakage power modeling for each of the device types forecast in the ITRS roadmap including bulk CMOS, SOI, and double-gate transistors. McPAT has a flexible XML interface to facilitate its use with many performance simulators. Combined with a performance simulator, McPAT enables architects to consistently quantify the cost of new ideas and assess tradeoffs of different architectures using new metrics like energy-delay-area2 product (EDA2P) and energy-delay-area product (EDAP). This paper explores the interconnect options of future manycore processors by varying the degree of clustering over generations of process technologies. Clustering will bring interesting tradeoffs between area and performance because the interconnects needed to group cores into clusters incur area overhead, but many applications can make good use of them due to synergies of cache sharing. Combining power, area, and timing results of McPAT with performance simulation of PARSEC benchmarks at the 22nm technology node for both common in-order and out-of-order manycore designs shows that when die cost is not taken into account clustering 8 cores together gives the best energy-delay product, whereas when cost is taken into account configuring clusters with 4 cores gives the best EDA2P and EDAP.

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McPAT: an integrated power, area, and timing modeling framework for multicore and manycore architectures

The development of silicon semiconductor technology has produced breakthroughs in electronics—from the microprocessor in the late 1960s to early 1970s, to automation, computers and smartphones—by downscaling the physical size of devices and wires to the nanometre regime. Now, graphene and related two-dimensional (2D) materials offer prospects of unprecedented advances in device performance at the atomic limit, and a synergistic combination of 2D materials with silicon chips promises a heterogeneous platform to deliver massively enhanced potential based on silicon technology. Integration is achieved via three-dimensional monolithic construction of multifunctional high-rise 2D silicon chips, enabling enhanced performance by exploiting the vertical direction and the functional diversification of the silicon platform for applications in opto-electronics and sensing. Here we review the opportunities, progress and challenges of integrating atomically thin materials with silicon-based nanosystems, and also consider the prospects for computational and non-computational applications. Progress in integrating atomically thin two-dimensional materials with silicon-based technology is reviewed, together with the associated opportunities and challenges, and a roadmap for future applications is presented.

Graphene and two-dimensional materials for silicon technology.

This review paper explores considerations for ultimate CMOS transistor scaling Transistor architectures such as extremely thin silicon-on-insulator and FinFET (and related architectures such as TriGate, Omega-FET, Pi-Gate), as well as nanowire device architectures, are compared and contrasted Key technology challenges (such as advanced gate stacks, mobility, resistance, and capacitance) shared by all of the architectures will be discussed in relation to recent research results

Considerations for Ultimate CMOS Scaling

Multiple logic devices are presently under study within the Nanoelectronic Research Initiative (NRI) to carry the development of integrated circuits beyond the complementary metal-oxide-semiconductor (CMOS) roadmap. Structure and operational principles of these devices are described. Theories used for benchmarking these devices are overviewed, and a general methodology is described for consistent estimates of the circuit area, switching time, and energy. The results of the comparison of the NRI logic devices using these benchmarks are presented.

Overview of Beyond-CMOS Devices and a Uniform Methodology for Their Benchmarking

A system includes a semiconductor device. The semiconductor device includes a first single crystal silicon layer comprising first transistors, first alignment marks, and at least one metal layer overlying the first single crystal silicon layer, wherein the at least one metal layer comprises copper or aluminum more than other materials; and a second single crystal silicon layer overlying the at least one metal layer. The second single crystal silicon layer comprises a plurality of second transistors arranged in substantially parallel bands. Each of a plurality of the bands comprises a portion of the second transistors along an axis in a repeating pattern.

System comprising a semiconductor device and structure

A 22nm generation logic technology is described incorporating fully-depleted tri-gate transistors for the first time. These transistors feature a 3rd-generation high-k + metal-gate technology and a 5th generation of channel strain techniques resulting in the highest drive currents yet reported for NMOS and PMOS. The use of tri-gate transistors provides steep subthreshold slopes (∼70mV/dec) and very low DIBL (∼50mV/V). Self-aligned contacts are implemented to eliminate restrictive contact to gate registration requirements. Interconnects feature 9 metal layers with ultra-low-k dielectrics throughout the interconnect stack. High density MIM capacitors using a hafnium based high-k dielectric are provided. The technology is in high volume manufacturing.

A 22nm high performance and low-power CMOS technology featuring fully-depleted tri-gate transistors, self-aligned contacts and high density MIM capacitors

Two key process features that are used to make 45 nm generation metal gate + high-k gate dielectric CMOS transistors are highlighted in this paper. The first feature is the integration of stress-enhancement techniques with the dual metal-gate + high-k transistors. The second feature is the extension of 193 nm dry lithography to the 45 nm technology node pitches. Use of these features has enabled industry-leading transistor performance and the first high volume 45 nm high-k + metal gate technology.

45nm High-k + metal gate strain-enhanced transistors

A leading edge 45 nm CMOS system-on-chip (SOC) technology using Hafnium-based high-k/metal gate transistors has been optimized for low power products. PMOS/NMOS logic transistor drive currents of 0.86/1.08 mA/um, respectively, have been achieved at 1.1 V and off-state leakage of 1 nA/um. Record RF performance for a mainstream 45 nm bulk CMOS technology has been achieved with measured fT/fMAX values of 395 GHz/410 GHz for NMOS and 300 GHz/325 GHz for PMOS with 28 nm Lgate transistors. HV I/O transistors with robust reliability and other SOC features, including linear resistors, MIS and MIM capacitors, varactors, inductors, vertical BJTs, precision diodes and high density OTP fuses are employed for HV I/O, analog and RF circuit integration.

A 45nm low power system-on-chip technology with dual gate (logic and I/O) high-k/metal gate strained silicon transistors

We present a high density MIM decoupling capacitor that enables improved microprocessor performance by providing robust on-chip power supply droop reduction The MIM dielectric is fabricated using ALD-deposited HfO 2 -Al 2 O 3 and HfO 2 -ZrO 2 high-k dielectrics with PVD TiN electrodes We achieve single MIM-cap densities of 37 fF/μm2 and 52 fF/μm2 that meet reliability requirement for both 198 V and 126 V use conditions The reliability of the HfO 2 -ZrO 2 capacitor shows minimal voltage polarity dependence, which enables the use of multi-plate MIM-caps to increase capacitance density We achieved a capacitance density of 141 fF/μm2 with a four-plate configuration, representing a 35× improvement over the reported capacitance density on Intel’s 14 nm process In addition, the stack meets environmental stress tests This MIM- cap improves the on-chip power delivery network, leading to an increase in maximum frequency of microprocessors and is now shipping in volume

D. Towner

Papers

A 22nm high performance and low-power CMOS technology featuring fully-depleted tri-gate transistors, self-aligned contacts and high density MIM capacitors

45nm High-k + metal gate strain-enhanced transistors

A 45nm low power system-on-chip technology with dual gate (logic and I/O) high-k/metal gate strained silicon transistors

Reliability Characteristics of a High Density Metal- Insulator-Metal Capacitor on Intel’s 10+ Process