D
Dae Hwan Kim
Researcher at Kookmin University
Publications - 307
Citations - 4721
Dae Hwan Kim is an academic researcher from Kookmin University. The author has contributed to research in topics: Thin-film transistor & Threshold voltage. The author has an hindex of 27, co-authored 267 publications receiving 3737 citations. Previous affiliations of Dae Hwan Kim include Chung-Ang University & Seoul National University.
Papers
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Proceedings ArticleDOI
High performance amorphous oxide thin film transistors with self-aligned top-gate structure
Jae Chul Park,Sang-Wook Kim,Sunil Kim,Huaxiang Yin,Ji-Hyun Hur,Sanghun Jeon,Sungho Park,I Hun Song,Youngsoo Park,U.-In Chung,Myung Kwan Ryu,Sangwon Lee,Sungchul Kim,Yongwoo Jeon,Dong Myong Kim,Dae Hwan Kim,Kee-Won Kwon,Chang Jung Kim +17 more
TL;DR: In this paper, a self-aligned top-gate amorphous oxide TFTs for large size and high resolution displays are presented, where Ar plasma is exposed on the source/drain region of active layer to minimize the source and drain series resistances.
Journal ArticleDOI
Extraction of Subgap Density of States in Amorphous InGaZnO Thin-Film Transistors by Using Multifrequency Capacitance–Voltage Characteristics
Sangwon Lee,Sungwook Park,Sungchul Kim,Yongwoo Jeon,Kichan Jeon,Jun-Hyun Park,Jae-Chul Park,I-hun Song,Chang Jung Kim,Youngsoo Park,Dong Myong Kim,Dae Hwan Kim +11 more
TL;DR: In this paper, an extraction technique for subgap density of states (DOS) in an n-channel amorphous InGaZnO thin-film transistor (TFT) by using multifrequency capacitancevoltage (C -V) characteristics is proposed and verified by comparing the measured I-V characteristics with the technology computer-aided design simulation results incorporating the extracted DOS as parameters.
Journal ArticleDOI
Highly Stable Transparent Amorphous Oxide Semiconductor Thin‐Film Transistors Having Double‐Stacked Active Layers
Jae Chul Park,Sang-Wook Kim,Sunil Kim,Chang-Jung Kim,Ihun Song,Youngsoo Park,U-In Jung,Dae Hwan Kim,Jang-Sik Lee +8 more
TL;DR: Amorphous oxide semiconductors have many advantages over conventional amorphous and polycrystalline silicon that are used for the channel layers of thin-fi lm transistors (TFTs), including a good short-range uniformity, a high-effect mobility, a large area uniform integration, a low cost and low temperature fabrication process, transparency, etc.
Journal ArticleDOI
Transparent, Flexible Strain Sensor Based on a Solution-Processed Carbon Nanotube Network.
Jieun Lee,Meehyun Lim,Jinsu Yoon,Min Seong Kim,Bongsik Choi,Dong Myong Kim,Dae Hwan Kim,Inkyu Park,Sung-Jin Choi +8 more
TL;DR: A sandwich-like structured strain sensor with excellent optical transparency based on highly purified, solution-processed, 99% metallic CNT-polydimethylsiloxane (PDMS) composite thin films that can be applied and controlled based on the need of individual applications.
Journal ArticleDOI
Study on the Photoresponse of Amorphous In–Ga–Zn–O and Zinc Oxynitride Semiconductor Devices by the Extraction of Sub-Gap-State Distribution and Device Simulation
Jun Tae Jang,Jozeph Park,Byung Du Ahn,Dong Myong Kim,Sung-Jin Choi,Hyun-Suk Kim,Dae Hwan Kim +6 more
TL;DR: The concept of activation energy window (AEW) is introduced to explain the occurrence of PPC effects by photoinduced electron doping, which is likely to be associated with the formation of peroxides in the semiconductor.