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Danial S. Abrams
Researcher at California Institute of Technology
Publications - 6
Citations - 1295
Danial S. Abrams is an academic researcher from California Institute of Technology. The author has contributed to research in topics: Quantum entanglement & Quantum sensor. The author has an hindex of 4, co-authored 6 publications receiving 1192 citations.
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Quantum interferometric lithography: exploiting entanglement to beat the diffraction limit
TL;DR: It is shown how to write arbitrary 2D patterns by using the nonclassical photon-number states method, and a factor of N = 2 can be achieved easily with entangled photon pairs generated from optical parametric down-conversion.
Proceedings Article
Quantum lithography
Samuel L. Braunstein,P. Kokcite,Agedi N. Boto,Danial S. Abrams,Colin P. Williams,Jonathan P. Dowling +5 more
TL;DR: In this paper, the authors developed a method called quantum lithography, which can be used to break through the miniaturisation barrier by using entangled photons, but the method is still theoretical and experimental progress is being made towards a full implementation.
Journal ArticleDOI
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Journal Article
Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Quantum Limit
TL;DR: Optical masking lithography has been the primary tool of the semiconductor industry for transferring circuit images onto substrates to form semiconductor chips as discussed by the authors, and it has been used extensively in the past few decades.