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Davide Bisi

Researcher at University of Padua

Publications -  50
Citations -  1663

Davide Bisi is an academic researcher from University of Padua. The author has contributed to research in topics: Gallium nitride & High-electron-mobility transistor. The author has an hindex of 17, co-authored 47 publications receiving 1260 citations.

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Deep-Level Characterization in GaN HEMTs-Part I: Advantages and Limitations of Drain Current Transient Measurements

TL;DR: In this paper, the advantages and limitations of the current-transient methods used for the study of the deep levels in GaN-based high-electron mobility transistors (HEMTs), by evaluating how the procedures adopted for measurement and data analysis can influence the results of the investigation.
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Buffer Traps in Fe-Doped AlGaN/GaN HEMTs: Investigation of the Physical Properties Based on Pulsed and Transient Measurements

TL;DR: In this paper, an extensive investigation of the trap with activation energy equal to 0.6 eV was performed on AlGaN/GaN HEMTs with increasing concentration of iron doping in the buffer.
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Negative Bias-Induced Threshold Voltage Instability in GaN-on-Si Power HEMTs

TL;DR: In this paper, the negative threshold voltage instability in GaN-on-Si metal-insulator-semiconductor high electron mobility transistors with partially recessed AlGaN was investigated.
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Reliability and parasitic issues in GaN-based power HEMTs: a review

TL;DR: In this paper, the authors review the parasitic mechanisms that affect the performance of GaN-on-Si HEMTs and describe the following relevant processes: (i) trapping of electrons in the buffer, induced by off-state operation; (ii) trapping hot electrons, which is promoted by semi-on state operation; and (iii) trapping, in the gate insulator, favored by the exposure to positive gate bias.
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Kinetics of Buffer-Related R ON -Increase in GaN-on-Silicon MIS-HEMTs

TL;DR: In this article, an extensive analysis of the charge capture transients induced by OFF-state bias in double heterostructure AlGaN/GaN MIS-high electron mobility transistor grown on silicon substrate is presented.