D
Douglas D. Coolbaugh
Researcher at State University of New York System
Publications - 240
Citations - 4143
Douglas D. Coolbaugh is an academic researcher from State University of New York System. The author has contributed to research in topics: Layer (electronics) & Silicon photonics. The author has an hindex of 33, co-authored 240 publications receiving 3796 citations. Previous affiliations of Douglas D. Coolbaugh include University at Albany, SUNY & State University of New York Polytechnic Institute.
Papers
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Journal ArticleDOI
Large-scale silicon nitride nanophotonic phased arrays at infrared and visible wavelengths.
Christopher V. Poulton,Matthew J. Byrd,Manan Raval,Zhan Su,Nanxi Li,Erman Timurdogan,Douglas D. Coolbaugh,Diedrik Vermeulen,Michael R. Watts +8 more
TL;DR: Using the same silicon nitride platform and phased array architecture, it is demonstrated that the first large-aperture visible nanophotonic phased array at 635 nm with an aperture size of 0.064°×0.074° is demonstrated, to the best of the authors' knowledge.
Journal ArticleDOI
Integrated phased array for wide-angle beam steering
TL;DR: An on-chip optical phased array fabricated in a CMOS compatible process with continuous, fast (100 kHz), wide-angle (51°) beam-steering suitable for applications such as low-cost LIDAR systems is demonstrated.
Journal ArticleDOI
Current status and future trends of SiGe BiCMOS technology
David L. Harame,David C. Ahlgren,Douglas D. Coolbaugh,J. Dunn,Gregory G. Freeman,J. D. Gillis,Robert A. Groves,G.N. Hendersen,R. Johnson,Alvin J. Joseph,S. Subbanna,A.M. Victor,Kimball M. Watson,C.S. Webster,Peter J. Zampardi +14 more
TL;DR: In this article, a base integration approach is presented which decouples the structural and thermal features of the HBT from the CMOS, and the trend is to use this approach for future SiGe technologies for easier migration to advanced CMOS technology generations.
Proceedings ArticleDOI
A 0.18 /spl mu/m BiCMOS technology featuring 120/100 GHz (f/sub T//f/sub max/) HBT and ASIC-compatible CMOS using copper interconnect
Alvin J. Joseph,Douglas D. Coolbaugh,Michael J. Zierak,Ryan Wayne Wuthrich,Peter J. Geiss,Z.X. He,Xuefeng Liu,Bradley A. Orner,Jeffrey B. Johnson,Gregory G. Freeman,David C. Ahlgren,Basanth Jagannathan,Louis D. Lanzerotti,Vidhya Ramachandran,J. Malinowski,H. Chen,Jack O. Chu,Peter B. Gray,R. Johnson,J. Dunn,S. Subbanna,Kathryn T. Schonenberg,David Harame,Robert A. Groves,K. Watson,D. Jadus,Mounir Meghelli,Alexander V. Rylyakov +27 more
TL;DR: IBM's next generation SiGe BiCMOS production technology targeted at the communications market is described and significant HBT performance enhancement compared to previously published results has been achieved through further collector and base profile optimization guided by process and device simulations.
Journal ArticleDOI
The AIM Photonics MPW: A Highly Accessible Cutting Edge Technology for Rapid Prototyping of Photonic Integrated Circuits
Nicholas M. Fahrenkopf,Colin McDonough,Gerald Leake,Zhan Su,Erman Timurdogan,Douglas D. Coolbaugh +5 more
TL;DR: The MPW service is enabled by a best-in-class process design kit (PDK) which allows designers to layout and obtain photonic integrated circuits (PICs) that work properly on the first run and enables a wide variety of silicon photonic applications.