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E. Fred Schubert

Researcher at Rensselaer Polytechnic Institute

Publications -  65
Citations -  6976

E. Fred Schubert is an academic researcher from Rensselaer Polytechnic Institute. The author has contributed to research in topics: Light-emitting diode & Voltage droop. The author has an hindex of 35, co-authored 65 publications receiving 6551 citations. Previous affiliations of E. Fred Schubert include Alcatel-Lucent.

Papers
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Origin of efficiency droop in GaN-based light-emitting diodes

TL;DR: In this paper, the efficiency droop in GaInN∕GaN multiple-quantum well (MQW) light-emitting diodes was investigated and it was shown that the droop is not related to MQW efficiency but rather to the recombination of carriers outside the MqW region.
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Optical thin-film materials with low refractive index for broadband elimination of Fresnel reflection

TL;DR: Optical thin-film materials with low refractive index for broadband elimination of Fresnel reflection were used in this paper, where the authors proposed a method to eliminate the reflection in optical thin-films.
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Polarization-matched GaInN∕AlGaInN multi-quantum-well light-emitting diodes with reduced efficiency droop

TL;DR: The use of quaternary alloys enables an independent control over interface polarization charges and bandgap and has been suggested as a method to reduce electron leakage from the active region, a carrier loss mechanism that can reduce efficiency at high injection currents as mentioned in this paper.
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Effect of dislocation density on efficiency droop in GaInN∕GaN light-emitting diodes

TL;DR: In this article, measurements of light-output power versus current were performed for GaInN∕GaN light-emitting diodes grown on GaN-on-sapphire templates with different threading dislocation densities.
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Nanostructured multilayer graded-index antireflection coating for Si solar cells with broadband and omnidirectional characteristics

TL;DR: In this paper, a broadband, omnidirectional, graded-index antireflection (AR) coating made using nanostructured low-refractive index (n=1.05-1.40) silica deposited by oblique-angle deposition is reported.