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Emile van Veldhoven

Researcher at Netherlands Organisation for Applied Scientific Research

Publications -  15
Citations -  486

Emile van Veldhoven is an academic researcher from Netherlands Organisation for Applied Scientific Research. The author has contributed to research in topics: Ion beam & Focused ion beam. The author has an hindex of 12, co-authored 15 publications receiving 454 citations. Previous affiliations of Emile van Veldhoven include University of Amsterdam & University of South Carolina.

Papers
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Journal ArticleDOI

Sub-10-nm nanolithography with a scanning helium beam

TL;DR: In this article, a pattern definition technique for dense sub-10-nm structures is presented, in terms of high resolution, high sensitivity, and a low proximity effect in a hydrogen silsesquioxane resist.
Proceedings ArticleDOI

Nanofabrication with a helium ion microscope

TL;DR: In this paper, the authors presented various nanofabrication results obtained with direct-write, with scanning helium ion beam lithography, and with helium ion ion beam induced deposition, using the recently introduced helium ion microscope (HIM) for imaging and fabrication of nanostructures.
Journal ArticleDOI

Nanopillar growth by focused helium ion-beam-induced deposition.

TL;DR: The observed relatively high growth rates suggest that electronic excitation is the dominant mechanism in helium ion-beam-induced deposition of PtC nanopillars, and Monte Carlo simulations reproduce the current dependences of the vertical and lateral growth rates and of the volumetric deposition efficiency.
Journal ArticleDOI

Imaging and nanofabrication with the helium ion microscope of the Van Leeuwenhoek Laboratory in Delft

TL;DR: This review presents a selection of studies conducted on a single instrument, covering applications ranging from imaging to nanofabrication and from fundamental academic research to applied industrial developments.