E
Eric Munro
Researcher at Imperial College London
Publications - 62
Citations - 668
Eric Munro is an academic researcher from Imperial College London. The author has contributed to research in topics: Electron-beam lithography & Electron optics. The author has an hindex of 10, co-authored 62 publications receiving 651 citations. Previous affiliations of Eric Munro include Avago Technologies & Alcatel-Lucent.
Papers
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Patent
Electron beam inspection system and method
Dan Meisburger,Alan D. Brodie,Curt H. Chadwick,Desai Anil,Hans Dohse,Emge Dennis,John D Greene,Ralph H. Johnson,Ling Ming-Yie,Mcmurtry John,Barry Becker,Paul Ray,Michael B. Robinson,Richard R. Simmons,Smith David E A,John C. Taylor,Lee H. Veneklasen,Dean Walters,Wieczorek Paul,Sam Wong,April Dutta,Lele Surendra,Rough Kirkwood,Henry Pearce-Percy,Jau Jack Y,Chun C. Lin,Hoi T. Nguyen,Oyang Yen-Jen,Hutcheson Timothy L,David J. Clark,Chung-Shih Pan,Chetana Bhaskar,Kirk Chris,Eric Munro +33 more
TL;DR: In this article, a substrate is mounted on an x-y stage to provide at least one degree of freedom while the substrate is being scanned by the charged particle beam, and an optical alignment system for initially aligning the substrate beneath the particle beam.
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Computer programs for the design and optimization of electron and ion beam lithography systems
TL;DR: In this paper, the authors describe computer programs developed in the electron optics group at Imperial College during the last seven years for the design and optimization of electron and ion beam lithography systems.
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Miniature low voltage beam systems producable by combined lithographies
TL;DR: In this paper, a miniaturized vacuum microelectronic 100 GHz switch is described, which is used to control the pixel dwell time within a shape with different time functions using additive lithography.
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Three‐dimensional computer modeling of electrostatic and magnetic electron optical components
John A. Rouse,Eric Munro +1 more
TL;DR: In this paper, a suite of programs for the computer-aided design of three-dimensional electron optical systems is described and illustrated, which can analyze electrostatic systems containing conductors and dielectrics with specified surface charge distributions.
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Simulation methods for multipole imaging systems and aberration correctors.
TL;DR: Two different methods have been derived and implemented for simulation of multipole imaging systems and aberration correctors, using a direct ray-tracing approach and an aberration theory for combinations of multipoles lenses and deflectors.