E
Evelyne Vallat-Sauvain
Researcher at University of Neuchâtel
Publications - 70
Citations - 4953
Evelyne Vallat-Sauvain is an academic researcher from University of Neuchâtel. The author has contributed to research in topics: Silicon & Solar cell. The author has an hindex of 29, co-authored 70 publications receiving 4803 citations. Previous affiliations of Evelyne Vallat-Sauvain include École Polytechnique Fédérale de Lausanne.
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Journal ArticleDOI
Thin‐film silicon solar cell technology
Arvind Shah,Horst Schade,Milan Vanecek,Johannes Meier,Evelyne Vallat-Sauvain,Nicolas Wyrsch,Ulrich Kroll,C. Droz,Julien Bailat +8 more
TL;DR: In this article, the authors describe the use of hydrogenated amorphous silicon (a-Si:H) and hydrogenated micro-crystalline silicon (μc-Si-H) thin films (layers), both deposited at low temperatures (200°C) by plasma-assisted chemical vapour deposition (PECVD), from a mixture of silane and hydrogen.
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Material and solar cell research in microcrystalline silicon
Arvind Shah,Johannes Meier,Evelyne Vallat-Sauvain,Nicolas Wyrsch,Ulrich Kroll,C. Droz,U. Graf +6 more
TL;DR: In this paper, the authors describe the introduction of hydrogenated microcrystalline silicon (μc-Si:H) as novel absorber material for thin-film silicon solar cells.
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Efficiency limits for single-junction and tandem solar cells
TL;DR: In this article, basic limitations of single-junction and tandem p-n and p-i-n diodes are established from thermodynamic considerations on radiative recombination and semi-empirical considerations on the classical diode equations.
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Low pressure chemical vapour deposition of ZnO layers for thin-film solar cells: temperature-induced morphological changes
TL;DR: In this article, a study of ZnO material deposited by the low-pressure chemical vapour deposition technique, in a pressure range below the pressures usually applied for the deposition of this kind of material, is presented.
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Model for a-Si: H/c-Si interface recombination based on the amphoteric nature of silicon dangling bonds
TL;DR: In this paper, the surface passivation properties of amorphous hydrogenated silicon a-Si:H on monocrystalline Si wafers are investigated and a simple model for the description of the surface recombination mechanism based on recombination through amphoteric defects is introduced.