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Florian Singer

Bio: Florian Singer is an academic researcher from University of Konstanz. The author has contributed to research in topics: Thin film & Carrier lifetime. The author has an hindex of 1, co-authored 1 publications receiving 8 citations.

Papers
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Journal ArticleDOI
TL;DR: In this article, an intrinsic and doped, hydrogen-less amorphous silicon films are RF magnetron sputter deposited and post-hydrogenated in a remote hydrogen plasma reactor at a temperature of 370°C.

9 citations


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Book ChapterDOI
09 Sep 2014

152 citations

Journal ArticleDOI
TL;DR: In this article, the porosity of underdense a-Si:H layer enables H penetration into the amorphous network and the Si:H/c-Si interface.
Abstract: Underdense hydrogenated amorphous silicon (a-Si:H) prepared by plasma-enhanced chemical vapor deposition was used as a passivation layer in silicon heterojunction (SHJ) solar cells. By reducing the thickness of the underdense a-Si:H passivation layer from 15 nm to 5 nm, the open circuit voltage (Voc) of the corresponding SHJ solar cell increased significantly from 724.3 mV to 738.6 mV. For comparison, a widely used transition-zone a-Si:H passivation layer was also examined, but reducing its thickness from 15 nm to 5 nm resulted in a continuous Voc reduction, from 724.1 mV to 704.3 mV. The highest efficiency was achieved using a 5-nm-thick underdense a-Si:H passivation layer. We propose that this advantageous property of underdense a-Si:H reflects its microstructural characteristics. While the porosity of a-Si:H layer enables H penetration into the amorphous network and the a-Si:H/c-Si interface, a high degree of disorder inhibits the formation of the epitaxial layer at the a-Si:H/c-Si interface during pos...

45 citations

Journal ArticleDOI
M. Grdeń1
TL;DR: The manuscript reviews several selected applications of Activation Analysis that differ from classical laboratory measurements by the fact that they do not require sampling of the analysed object and/or measurements under analytical laboratory conditions.
Abstract: The manuscript reviews several selected applications of Activation Analysis that differ from classical laboratory measurements by the fact that they do not require sampling of the analysed object and/or measurements under analytical laboratory conditions. One of great advantages of the Activation Analysis lies in its versatility that allows it to be applied under conditions not available for other analytical techniques.

15 citations

Journal ArticleDOI
TL;DR: In this paper, bias-plasma assisted radio frequency magnetron sputter deposition (RFSD) is used to flatten the a-Si surface of the film, resulting in an amorphous network with only few vacancies and related defects.

7 citations

Book ChapterDOI
01 Jan 2019
TL;DR: In this article, the main focus is on physical vapor deposition techniques, with special emphasis on plasma processing techniques, i.e., sputter deposition and pulsed laser deposition, as well as ion plating and ion beam-assisted deposition.
Abstract: This chapter is devoted to the description of available experimental methods which are used for the fabrication of glassy and amorphous thin films or coatings on glass. Current deposition techniques offer great flexibility for the fabrication of such thin films with specific chemistry and microstructure leading to films and coatings with distinctive properties. After a brief introduction to amorphous thin films' processing, general information regarding film nucleation and growth, its microstructure and films' characterization techniques, the main focus is on physical vapor deposition techniques, with special emphasis on plasma processing techniques, i. e., sputter deposition and pulsed laser deposition. The classical vapor deposition techniques as well as ion plating and ion beam-assisted deposition are also briefly described. The chapter then describes the exploitation of chemical vapor deposition, after which a comparison of physical vapor deposition processes with chemical vapor deposition is given. Amorphous thin film fabrication via liquids is shortly reviewed, and finally an outlook regarding the contribution of amorphous thin films and coatings to societal development in the 21st century closes the chapter.

6 citations