G. Asova

Bio: G. Asova is an academic researcher. The author has contributed to research in topics: DESY & Thermal emittance. The author has an hindex of 9, co-authored 40 publications receiving 1699 citations.

Operation of a free-electron laser from the extreme ultraviolet to the water window

Abstract: We report results on the performance of a free-electron laser operating at a wavelength of 13.7 nm where unprecedented peak and average powers for a coherent extreme-ultraviolet radiation source have been measured. In the saturation regime, the peak energy approached 170 J for individual pulses, and the average energy per pulse reached 70 J. The pulse duration was in the region of 10 fs, and peak powers of 10 GW were achieved. At a pulse repetition frequency of 700 pulses per second, the average extreme-ultraviolet power reached 20 mW. The output beam also contained a significant contribution from odd harmonics of approximately 0.6% and 0.03% for the 3rd (4.6 nm) and the 5th (2.75 nm) harmonics, respectively. At 2.75 nm the 5th harmonic of the radiation reaches deep into the water window, a wavelength range that is crucially important for the investigation of biological samples.

Experimentally minimized beam emittance from an L-band photoinjector

Abstract: High brightness electron sources for linac based free-electron lasers (FELs) are being developed at the Photo Injector Test facility at DESY, Zeuthen site (PITZ). Production of electron bunches with extremely small transverse emittance is the focus of the PITZ scientific program. The photoinjector optimization in 2008–2009 for a bunch charge of 1, 0.5, 0.25, and 0.1 nC resulted in measured emittance values which are beyond the requirements of the European XFEL [S. Rimjaem et al., Nucl. Instrum. Methods Phys. Res., Sect. A 671, 62 (2012)]. Several essential modifications were commissioned in 2010–2011 at PITZ, resulting in further improvement of the photoinjector performance. Significant improvement of the rf gun phase stability is a major contribution in the reduction of the measured transverse emittance. The old TESLA prototype booster was replaced by a new cut disk structure cavity. This allows acceleration of the electron beam to higher energies and supports much higher flexibility for stable booster operation as well as for longer rf pulses which is of vital importance especially for the emittance optimization of low charge bunches. The transverse phase space of the electron beam was optimized at PITZ for bunch charges in the range between 0.02 and 2 nC, where the quality of the beam measurements was preserved by utilizing long pulse train operation. The experimental optimization yielded worldwide unprecedented low normalized emittance beams in the whole charge range studied.

Detailed characterization of electron sources yielding first demonstration of European X-ray Free-Electron Laser beam quality

Abstract: The photoinjector test facility at DESY, Zeuthen site (PITZ), was built to develop and optimize photoelectron sources for superconducting linacs for high-brilliance, short-wavelength free-electron laser (FEL) applications like the free-electron laser in Hamburg (FLASH) and the European x-ray free-electron laser (XFEL). In this paper, the detailed characterization of two laser-driven rf guns with different operating conditions is described. One experimental optimization of the beam parameters was performed at an accelerating gradient of about 43 MV=m at the photocathode and the other at about 60 MV=m. In both cases, electron beams with very high phase-space density have been demonstrated at a bunch charge of 1 nC and are compared with corresponding simulations. The rf gun optimized for the lower gradient has surpassed all the FLASH requirements on beam quality and rf parameters (gradient, rf pulse length, repetition rate) and serves as a spare gun for this facility. The rf gun studied with increased accelerating gradient at the cathode produced beams with even higher brightness, yielding the first demonstration of the beam quality required for driving the European XFEL: The geometric mean of the normalized projected rms emittance in the two transverse directions was measured to be 1:26 ` 0:13 mm mrad for a 1-nC electron bunch. When a 10% charge cut is applied excluding electrons from those phase-space regions where the measured phase-space density is below a certain level and which are not expected to contribute to the lasing process, the normalized projected rms emittance is about 0.9 mm mrad.

Observation of High Transformer Ratio Plasma Wakefield Acceleration

Abstract: Particle-beam-driven plasma wakefield acceleration (PWFA) enables various novel high-gradient techniques for powering future compact light-source and high-energy physics applications. Here, a driving particle bunch excites a wakefield response in a plasma medium, which may rapidly accelerate a trailing witness beam. In this Letter, we present the measurement of ratios of acceleration of the witness bunch to deceleration of the driver bunch, the so-called transformer ratio, significantly exceeding the fundamental theoretical and thus far experimental limit of 2 in a PWFA. An electron bunch with ramped current profile was utilized to accelerate a witness bunch with a transformer ratio of 4.6_{-0.7}^{+2.2} in a plasma with length ∼10 cm, also demonstrating stable transport of driver bunches with lengths on the order of the plasma wavelength.

Recent results and perspectives of the low emittance photo injector at pitz

Abstract: The Photo Injector Test Facility at Zeuthen (PITZ) was built to study the production of minimum transverse emittance electron beams for Free Electron Lasers and future Linear Colliders. Until November 2003, the electron beam from the rf gun has been fully characterized at PITZ. For a bunch charge of 1 nC a minimum normalized projected beam emittance of 1.5 π mm mrad in the vertical plane and a minimum geometrical average of both transverse planes of 1.7 π mm mrad have been achieved. This fulfills the requirements of the VUV-FEL at DESY. In this contribution, an overview of the measured electron beam and high duty cycle rf parameters including transverse emittance, thermal emittance, bunch length, momentum, and momentum spread will be given. In addition, planned major upgrades and first results towards fulfilling the even more challenging requirements for the European XFEL will be discussed. This includes measurements with increased average and peak rf power and the improvement of the transverse laser beam profile.

First lasing and operation of an ångstrom-wavelength free-electron laser

Abstract: The Linac Coherent Light Source free-electron laser has now achieved coherent X-ray generation down to a wavelength of 1.2 A and at a brightness that is nearly ten orders of magnitude higher than conventional synchrotrons. Researchers detail the first operation and beam characteristics of the system, which give hope for imaging at atomic spatial and temporal scales.

A compact X-ray free-electron laser emitting in the sub-ångström region

Abstract: Researchers report sub-angstrom fundamental-wavelength lasing at the SPring-8 Angstrom Compact Free-Electron Laser in Japan. The output has a maximum power of more than 10 GW, a pulse duration of 10−14 s and a lasing wavelength of 0.634 A.

Theory and Design of Charged Particle Beams

Abstract: Review of Charged Particle Dynamics. Beam Optics and Focusing Systems Without Space Charge. Linear Beam Optics with Space Charge. Self-Consistent Theory of Beams. Emittance Variation. Beam Physics Research from 1993 to 2007. Appendices. List of Frequently Used Symbols. Bibliography. Index.

Highly coherent and stable pulses from the FERMI seeded free-electron laser in the extreme ultraviolet

Abstract: Researchers demonstrate the FERMI free-electron laser operating in the high-gain harmonic generation regime, allowing high stability, transverse and longitudinal coherence and polarization control.

X-Rays and Extreme Ultraviolet Radiation: Principles and Applications

Abstract: This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include EUV lithography, biomicroscopy, spectromicroscopy, EUV astronomy, synchrotron radiation, and soft x-ray lasers. He also provides a great deal of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science.