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Georges Pavlidis

Researcher at Georgia Institute of Technology

Publications -  22
Citations -  419

Georges Pavlidis is an academic researcher from Georgia Institute of Technology. The author has contributed to research in topics: Gallium nitride & Thermal resistance. The author has an hindex of 9, co-authored 22 publications receiving 269 citations. Previous affiliations of Georges Pavlidis include National Institute of Standards and Technology.

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Journal ArticleDOI

Field-effect transistors based on wafer-scale, highly uniform few-layer p-type WSe2

TL;DR: The unprecedented uniformity of the few-layer p-type WSe2 with wafer-scale thickness and electrical uniformity is synthesized through direct selenization of thin films of e-beam evaporated W on SiO2 substrates.
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Spontaneous current constriction in threshold switching devices

TL;DR: It is reported that the TaOx-based conductive filament formation, the current density and temperature are not-uniform distributions and electric field domains are not required, and the S-type negative differential resistance I–V characteristics are only a subset of possible solutions.
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Thermal characterization of gallium nitride p-i-n diodes

TL;DR: In this paper, various thermal characterization techniques and multi-physics modeling were applied to understand the thermal characteristics of GaN vertical and quasi-vertical power diodes Optical thermography techniques typically used for lateral GaN device temperature assessment including infrared thermography, thermoreflectance thermal imaging, and Raman thermometry were employed to determine if each technique is capable of providing insight into the thermal properties of vertical devices.
Proceedings ArticleDOI

High Resolution Thermal Characterization and Simulation of Power AlGaN/GaN HEMTs Using Micro-Raman Thermography and 800 Picosecond Transient Thermoreflectance Imaging

TL;DR: In this article, self-heating in gallium nitride based high frequency, high electron mobility power transistors (GaN HEMTs) is inspected using micro-Raman thermography and 800 picosecond transient thermoreflectance imaging.
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Characterization of AlGaN/GaN HEMTs Using Gate Resistance Thermometry

TL;DR: In this article, gate resistance thermometry (GRT) was used to determine the channel temperature of AlGaN/GaN high electron-mobility transistors under various bias conditions.