scispace - formally typeset
G

Gerard Mourou

Researcher at École Polytechnique

Publications -  664
Citations -  36215

Gerard Mourou is an academic researcher from École Polytechnique. The author has contributed to research in topics: Laser & Ultrashort pulse. The author has an hindex of 82, co-authored 653 publications receiving 34147 citations. Previous affiliations of Gerard Mourou include University of Michigan & San Diego State University.

Papers
More filters
Journal ArticleDOI

Short-pulse laser damage in transparent materials as a function of pulse duration

TL;DR: In this article, a single-shot damage threshold measurement and modeling for fused silica at 800 nm as a function of pulse duration down to 20 fs was presented, and the respective roles of multiphoton ionization, tunnel ionization and impact ionization in laser damage were examined.
Journal ArticleDOI

Time-resolved observation of electron-phonon relaxation in copper.

TL;DR: In this paper, the process of electron-phonon energy transfer was time resolved and was observed to be 1--4 ps increasing with the laser fluence, and non-equilibrium electron-lattice temperatures were observed.
Journal ArticleDOI

Ultrahigh‐Intensity Lasers: Physics of the Extreme on a Tabletop

TL;DR: In this paper, it was shown that at these intensities, the light pressure, P = I/c, is extreme, on the order of giga-to-terabars.
Patent

Method for controlling configuration of laser induced breakdown and ablation

TL;DR: In this article, the authors proposed a method for laser induced breakdown of a material with a pulsed laser beam where the material is characterized by a relationship of fluence breakdown threshold (Fth) versus laser beam pulse width (T) that exhibits an abrupt, rapid, and distinct change or at least a clearly detectable change in slope at a predetermined laser pulse width value.
Journal ArticleDOI

Machining of sub-micron holes using a femtosecond laser at 800 nm

TL;DR: In this article, a Ti:sapphire laser was used to ablate holes with a diameter of 300 nm and a depth of 52 nm to produce very small features in materials.