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Giuseppe Coppola

Researcher at National Research Council

Publications -  268
Citations -  6298

Giuseppe Coppola is an academic researcher from National Research Council. The author has contributed to research in topics: Digital holography & Holography. The author has an hindex of 40, co-authored 256 publications receiving 5489 citations. Previous affiliations of Giuseppe Coppola include Seconda Università degli Studi di Napoli & University of Naples Federico II.

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Journal ArticleDOI

In Vitro Assessment of Salt Stress Tolerance in Wild Potato Species

TL;DR: The most promising sources of salt tolerance were identified in S. commersonii and S. multidissectum and information obtained is discussed from a breeding perspective as discussed by the authors , and a significant correlation between root plasticity and salt tolerance was found, and changes in proline and total phenolic content were assessed to envisage the metabolic adjustments of tolerant clones towards salinity.
Proceedings ArticleDOI

An integrated Si-based electro-optical modulator

TL;DR: In this paper, an electro-optic Si-based modulator working at 1.5 um using a bipolar mode field effect transistor integrated within a Si rib waveguide is presented.
Proceedings ArticleDOI

CMOS-compatible amorphous silicon photonic layer integrated with VLSI electronics

TL;DR: In this paper, the performance of different configurations of a-Si:H-based electro-optical amplitude modulators integrated into passive waveguides is discussed. But the authors focus on the plasma dispersion effect, a phenomenon that allows to reach useful performances at the communication wavelengths of λ~1.55 μm.
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Photoluminescence of graphene oxide integrated with silicon substrates

TL;DR: In this article, the photoluminescence signal emitted by graphene oxide (GO) nanosheets infiltrated in silanized porous silicon (PSi) matrix was investigated, and a strong enhancement of the PL emitted from GO by a factor of almost 2.5 with respect to GO on crystalline silicon was experimentally measured.
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Photolithography by a tunable electro-optical lithium niobate phase array

TL;DR: In this paper, an optical phase mask with an electrooptically tunable phase step is used for photolithographic experiments. But the phase mask consists of a 2-dimensional hexagonal lattice of inverted ferroelectric domains fabricated on a z-cut lithium niobate substrate and the phase step, between inverted domain, is obtained by the application of an external electric field along the z axis of the crystal via transparent electrodes.