H. A. van Laarhoven

Bio: H. A. van Laarhoven is an academic researcher from University of Pretoria. The author has contributed to research in topics: Deep-level transient spectroscopy & Schottky barrier. The author has an hindex of 2, co-authored 3 publications receiving 346 citations.

Electrical Characterization of 1.8 MeV Proton-Bombarded ZnO

Abstract: We report on the electrical characterization of single-crystal ZnO and Au Schottky contacts formed thereon before and after bombarding them with 1.8 MeV protons. From capacitance–voltage measurements, we found that ZnO is remarkably resistant to high-energy proton bombardment and that each incident proton removes about two orders of magnitude less carriers than in GaN. Deep level transient spectroscopy indicates a similar effect: the two electron traps detected are introduced in extremely low rates. One possible interpretation of these results is that the primary radiation-induced defects in ZnO may be unstable at room temperature and anneal out without leaving harmful defects that are responsible for carrier compensation.

The influence of high energy proton bombardment on the electrical and defect properties of single-crystal ZnO

Abstract: We report on the electrical and defect characterization of Au Schottky diodes formed on single-crystal ZnO, before and after irradiating with high-energy (1.8 MeV) protons. Prior to bombardment we observed that several electron traps (E1-E4), with energies between 0.10 and 0.57 eV below the conduction band, are present in the ZnO. High-energy proton bombardment introduces two electron traps (Ep1 and Ep2), with extremely low introduction rates (η) of 2.4 and 1.9 cm-1, respectively. Schottky barrier properties such as the reverse leakage current deteriorated from 1×10-9 A for an unirradiated diode to 1×10-6 A after bombarding it with a dose of 4.2×1014 cm-2 protons. Compared to GaN we found that ZnO is remarkably resistant to high-energy proton bombardment.

Defects Created by 25 keV Hydrogen Implantation in n-type GaN

Abstract: We have studied defects introduced in n-GaN during 25 keV hydrogen and 40 keV He implantation using deep level transient spectroscopy (DLTS). These measurements revealed that 25 keV hydrogen implantation introduces a complex set of electron traps, of which most are different to the defects observed after high-energy (MeV) electron and proton implantation. At least three of the defects detected after 25 keV proton implantation exhibit a metastable character in that they can be reproducibly removed and re-introduced during reverse and zero bias anneal cycles. Isochronal and isothermal annealing experiments yielded low activation energies of approximately 0.1 − 0.2 eV for both processes. By comparison, 40 keV He ion implantation introduced the same metastable defects, but in different relative concentrations.

A comprehensive review of zno materials and devices

Abstract: The semiconductor ZnO has gained substantial interest in the research community in part because of its large exciton binding energy (60meV) which could lead to lasing action based on exciton recombination even above room temperature. Even though research focusing on ZnO goes back many decades, the renewed interest is fueled by availability of high-quality substrates and reports of p-type conduction and ferromagnetic behavior when doped with transitions metals, both of which remain controversial. It is this renewed interest in ZnO which forms the basis of this review. As mentioned already, ZnO is not new to the semiconductor field, with studies of its lattice parameter dating back to 1935 by Bunn [Proc. Phys. Soc. London 47, 836 (1935)], studies of its vibrational properties with Raman scattering in 1966 by Damen et al. [Phys. Rev. 142, 570 (1966)], detailed optical studies in 1954 by Mollwo [Z. Angew. Phys. 6, 257 (1954)], and its growth by chemical-vapor transport in 1970 by Galli and Coker [Appl. Phys. ...

Recent advances in processing of ZnO

Abstract: A review is given of recent results in developing improved fabrication processes for ZnO devices with the possible application to UV light emitters, spin functional devices, gas sensors, transparent electronics, and surface acoustic wave devices. There is also interest in integrating ZnO with other wide band-gap semiconductors, such as the AlInGaN system. In this article, we summarize recent progress in controlling n- and p-type doping, materials processing methods, such as ion implantation for doping or isolation, Ohmic and Schottky contact formation, plasma etching, the role of hydrogen in the background n-type conductivity of many ZnO films, and finally, the recent achievement of room-temperature ferromagnetism in transition-metal (Mn or Co)-doped ZnO. This may lead to another class of spintronic devices, in which the spin of the carriers is exploited rather than the charge as in more conventional structures.

ZnO-Based Ultraviolet Photodetectors

Abstract: Ultraviolet (UV) photodetection has drawn a great deal of attention in recent years due to a wide range of civil and military applications. Because of its wide band gap, low cost, strong radiation hardness and high chemical stability, ZnO are regarded as one of the most promising candidates for UV photodetectors. Additionally, doping in ZnO with Mg elements can adjust the bandgap largely and make it feasible to prepare UV photodetectors with different cut-off wavelengths. ZnO-based photoconductors, Schottky photodiodes, metal–semiconductor–metal photodiodes and p–n junction photodetectors have been developed. In this work, it mainly focuses on the ZnO and ZnMgO films photodetectors. We analyze the performance of ZnO-based photodetectors, discussing recent achievements, and comparing the characteristics of the various photodetector structures developed to date.