H
H. Launois
Researcher at Centre national de la recherche scientifique
Publications - 43
Citations - 3399
H. Launois is an academic researcher from Centre national de la recherche scientifique. The author has contributed to research in topics: Coulomb blockade & Electron-beam lithography. The author has an hindex of 19, co-authored 43 publications receiving 3188 citations.
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Journal ArticleDOI
Electron beam lithography: resolution limits and applications
Christophe Vieu,Franck Carcenac,A. Pépin,Yong Chen,M. Mejias,A. Lebib,L. Manin-Ferlazzo,L. Couraud,H. Launois +8 more
TL;DR: In this article, the authors report on the resolution limits of EBL in the conventional polymethylmethacrylate (PMMA) organic resist and show that resolution can be pushed below 10 nm for isolated features and dense arrays of periodic structures can be fabricated at a pitch of 30 nm, leading to a density close to 700 Gbit/in2.
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Planar Patterned Magnetic Media Obtained by Ion Irradiation
Claude Chappert,Harry Bernas,Jacques Ferré,V. Kottler,J.P. Jamet,Yong Chen,Edmond Cambril,Thibaut Devolder,F. Rousseaux,V. Mathet,H. Launois +10 more
TL;DR: By ion irradiation through a lithographically made resist mask, the magnetic properties of cobalt-platinum simple sandwiches and multilayers were patterned without affecting their roughness and optical properties.
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Design and fabrication of blazed binary diffractive elements with sampling periods smaller than the structural cutoff
TL;DR: In this article, the theoretical performance of blazed binary diffractive elements composed of pillars carefully arranged on a two-dimensional grid whose period is smaller than the structural cutoff was investigated through electromagnetic theories.
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Blazed binary subwavelength gratings with efficiencies larger than those of conventional échelette gratings
TL;DR: A new structural cutoff beyond which subwavelength gratings cease to behave as homogeneous media is introduced and its effects on the proper selection of the sampling periods of subwa wavelength diffractive elements are discussed.
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High-efficiency subwavelength diffractive element patterned in a high-refractive-index material for 633 nm.
TL;DR: The use of high-index materials for the fabrication of subwavelength diffractive components operating in the visible domain yields a reduction of fabrication constraints and an improvement of theoretical performance.