scispace - formally typeset
Search or ask a question
Author

Hiroki Kishil

Bio: Hiroki Kishil is an academic researcher. The author has contributed to research in topics: Etching (microfabrication) & Wafer. The author has co-authored 1 publications.

Papers
More filters
01 Jan 2011
TL;DR: In this article, the embedded strain gauges in a PQC-TEG were applied to the measurement of the change of the residual stress in a transistor structure with a 50nm wide gate during thin film processing.
Abstract: The embedded strain gauges in a PQC-TEG were applied to the measurement of the change of the residual stress in a transistor structure with a 50-nm wide gate during thin film processing. The change of the residual stress was successfully monitored through the process such as the deposition and etching of thin films. Tn addition, the fluctuation of the process such as the intrinsic stress of thin films and the height and the width of the etched structures was also detected by the statistical analysis of the measured data. The sensitivity of the measurement was 1 MPa and it was validated that the amplitude of the fluctuation exceeded 100 MPa. This technique is also effective for detecting the spatial distribution of the stress in a wafer and its fluctuation among wafers.