Hong-Liang Lu

Bio: Hong-Liang Lu is an academic researcher from Fudan University. The author has contributed to research in topics: Atomic layer deposition & Thin film. The author has an hindex of 28, co-authored 170 publications receiving 2768 citations. Previous affiliations of Hong-Liang Lu include Chinese Academy of Sciences & Olivetti.

Stability and strength of atomically thin borophene from first principles calculations

Abstract: A new 2D material, borophene, has been grown successfully recently on single crystal Ag substrates. Three main structures have been proposed (, and striped borophene). However, the stability of three structures is still in debate. Using first principles calculations, we examine the dynamical, thermodynamical and mechanical stability of , and striped borophene. Free-standing and borophene is dynamically, thermodynamically and mechanically stable, while striped borophene is dynamically and thermodynamically unstable due to high stiffness along a direction. The origin of high stiffness and high instability in striped borophene along a direction can both be attributed to strong directional bonding. Our work shows a deep connection between stability and strength, and helps researchers to estimate accurately the mechanical performance of 2D materials.

Stability and Strength of Atomically Thin Borophene from First Principles Calculations

Abstract: A new two-dimensional (2D) material, borophene (2D boron sheet), has been grown successfully recently on single crystal Ag substrates by two parallel experiments [Mannix \textit{et al., Science}, 2015, \textbf{350}, 1513] [Feng \textit{et al., Nature Chemistry}, 2016, \textbf{advance online publication}]. Three main structures have been proposed ($\beta_{12}$, $\chi_3$ and striped borophene). However, the stability of three structures is still in debate. Using first principles calculations, we examine the dynamical, thermodynamical and mechanical stability of $\beta_{12}$, $\chi_3$ and striped borophene. Free-standing $\beta_{12}$ and $\chi_3$ borophene is dynamically, thermodynamically, and mechanically stable, while striped borophene is dynamically and thermodynamically unstable due to high stiffness along $a$ direction. The origin of high stiffness and high instability in striped borophene along $a$ direction can both be attributed to strong directional bonding. This work provides a benchmark for examining the relative stability of different structures of borophene.

First-principle calculations of phononic, electronic and optical properties of monolayer arsenene and antimonene allotropes

Abstract: Recently a stable monolayer of antimony in buckled honeycomb structure called antimonene was successfully grown on 3D topological insulator Bi$_2$Te$_3$ and Sb$_2$Te$_3$, which displays semiconducting properties. By first principle calculations, we systematically investigate the phononic, electronic and optical properties of $\alpha-$ and $\beta-$ allotropes of monolayer arsenene/antimonene. We investigate the dynamical stabilities of these four materials by considering the phonon dispersions. The obtained electronic structures reveal the direct band gap of monolayer $\alpha-$As/Sb and indirect band gap of $\beta-$As/Sb. Significant absorption is observed in $\alpha-$Sb, which can be used as a broad saturable absorber.

Fabrication of a Micro-Electromechanical System-Based Acetone Gas Sensor Using CeO2 Nanodot-Decorated WO3 Nanowires

Abstract: Preparation of reliable, stable, and highly responsive gas-sensing devices for the detection of acetone has been considered to be a key issue for the development of accurate disease diagnosis syste...

The mechanism of the asymmetric SET and RESET speed of graphene oxide based flexible resistive switching memories

Abstract: Oxygen migration is reported as key factors of resistive switching in graphene oxide (GO) based memories by different groups. A flexible nonvolatile resistive switching memory based on GO was fabricated through a spin-coating process. The speed of the SET and RESET operations of the GO memories was found to be significant asymmetric. The RESET speed is in the order of 100 ns under a −5 V voltage while the SET speed is three orders of magnitude slower (100 μs) under a 5 V bias. The behavior of resistive switching speed difference is elucidated by voltage modulated oxygen diffusion barrier change.

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

Abstract: Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely suitable for depositing uniform and conformal films on complex three-dimensional topographies. The deposition of a film of a given material by ALD relies on the successive, separated, and self-terminating gas–solid reactions of typically two gaseous reactants. Hundreds of ALD chemistries have been found for depositing a variety of materials during the past decades, mostly for inorganic materials but lately also for organic and inorganic–organic hybrid compounds. One factor that often dictates the properties of ALD films in actual applications is the crystallinity of the grown film: Is the material amorphous or, if it is crystalline, which phase(s) is (are) present. In this thematic review, we first describe the basics of ALD, summarize the two-reactant ALD processes to grow inorganic materials developed to-date, updating the information of an earlier review on ALD [R. L. Puurunen, J. Appl. Phys. 97, 121301 (2005)], and give an overview of the status of processing ternary compounds by ALD. We then proceed to analyze the published experimental data for information on the crystallinity and phase of inorganic materials deposited by ALD from different reactants at different temperatures. The data are collected for films in their as-deposited state and tabulated for easy reference. Case studies are presented to illustrate the effect of different process parameters on crystallinity for representative materials: aluminium oxide, zirconium oxide, zinc oxide, titanium nitride, zinc zulfide, and ruthenium. Finally, we discuss the general trends in the development of film crystallinity as function of ALD process parameters. The authors hope that this review will help newcomers to ALD to familiarize themselves with the complex world of crystalline ALD films and, at the same time, serve for the expert as a handbook-type reference source on ALD processes and film crystallinity.

Recent progress in resistive random access memories: Materials, switching mechanisms, and performance

Abstract: This review article attempts to provide a comprehensive review of the recent progress in the so-called resistive random access memories (RRAMs) First, a brief introduction is presented to describe the construction and development of RRAMs, their potential for broad applications in the fields of nonvolatile memory, unconventional computing and logic devices, and the focus of research concerning RRAMs over the past decade Second, both inorganic and organic materials used in RRAMs are summarized, and their respective advantages and shortcomings are discussed Third, the important switching mechanisms are discussed in depth and are classified into ion migration, charge trapping/de-trapping, thermochemical reaction, exclusive mechanisms in inorganics, and exclusive mechanisms in organics Fourth, attention is given to the application of RRAMs for data storage, including their current performance, methods for performance enhancement, sneak-path issue and possible solutions, and demonstrations of 2-D and 3-D crossbar arrays Fifth, prospective applications of RRAMs in unconventional computing, as well as logic devices and multi-functionalization of RRAMs, are comprehensively summarized and thoroughly discussed The present review article ends with a short discussion concerning the challenges and future prospects of the RRAMs

Few-Layer MoS2: A Promising Layered Semiconductor

Abstract: Due to the recent expanding interest in two-dimensional layered materials, molybdenum disulfide (MoS2) has been receiving much research attention. Having an ultrathin layered structure and an appreciable direct band gap of 1.9 eV in the monolayer regime, few-layer MoS2 has good potential applications in nanoelectronics, optoelectronics, and flexible devices. In addition, the capability of controlling spin and valley degrees of freedom makes it a promising material for spintronic and valleytronic devices. In this review, we attempt to provide an overview of the research relevant to the structural and physical properties, fabrication methods, and electronic devices of few-layer MoS2. Recent developments and advances in studying the material are highlighted.

Nanostructured materials for photocatalysis

Abstract: Photocatalysis is a green technology which converts abundantly available photonic energy into useful chemical energy. With a rapid rise of flow photoreactors in the last decade, the design and development of novel semiconductor photocatalysts is happening at a blistering rate. Currently, developed synthetic approaches have allowed the design of diverse modified/unmodified semiconductor materials exhibiting enhanced performances in heterogeneous photocatalysis. In this review, we have classified the so far reported highly efficient modified/unmodified semiconductor photocatalysts into four different categories based on the elemental composition, band gap engineering and charge carrier migration mechanism in composite photocatalysts. The recent synthetic developments are reported for each novel semiconductor photocatalyst within the four different categories, namely: pure semiconductors, solid solutions, type-II heterojunction nanocomposites and Z-scheme. The motivation behind the synthetic upgrading of modified/unmodified (pure) semiconductor photocatalysts along with their particular photochemical applications and photoreactor systems have been thoroughly reviewed.

Chloride molecular doping technique on 2D materials: WS2 and MoS2.

Abstract: Low-resistivity metal–semiconductor (M–S) contact is one of the urgent challenges in the research of 2D transition metal dichalcogenides (TMDs). Here, we report a chloride molecular doping technique which greatly reduces the contact resistance (Rc) in the few-layer WS2 and MoS2. After doping, the Rc of WS2 and MoS2 have been decreased to 0.7 kΩ·μm and 0.5 kΩ·μm, respectively. The significant reduction of the Rc is attributed to the achieved high electron-doping density, thus a significant reduction of Schottky barrier width. As a proof-of-concept, high-performance few-layer WS2 field-effect transistors (FETs) are demonstrated, exhibiting a high drain current of 380 μA/μm, an on/off ratio of 4 × 106, and a peak field-effect mobility of 60 cm2/(V·s). This doping technique provides a highly viable route to diminish the Rc in TMDs, paving the way for high-performance 2D nanoelectronic devices.