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Hyun-Jin Song

Bio: Hyun-Jin Song is an academic researcher. The author has contributed to research in topics: Etching (microfabrication) & Reverse leakage current. The author has an hindex of 1, co-authored 2 publications receiving 44 citations.

Papers
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Journal ArticleDOI
TL;DR: In this paper, an effective chemical etching treatment to remove a boron-rich layer which has a significant negative impact on n-type silicon (Si) solar cells with a BORON emitter was reported.
Abstract: This paper reports on an effective chemical etching treatment to remove a boron-rich layer which has a significant negative impact on n-type silicon (Si) solar cells with boron emitter. A nitric acid-grown oxide/silicon nitride stack passivation on the boron-rich layer-etched boron emitter markedly decreases the emitter saturation current density J0e from 430 to 100 fA/cm2. This led to 1.6% increase in absolute cell efficiency including 22 mV increase in open-circuit voltage Voc and 1.9 mA/cm2 increase in short-circuit current density Jsc. This resulted in screen-printed large area (239 cm2) n-type Si solar cells with efficiency of 19.0%.

49 citations

Journal Article
TL;DR: In this paper, a p-type crystalline silicon (Si) solar cells using screen-printing process and investigated their electrical properties were fabricated and the currentvoltage characteristics were carried out in the temperature range of 175-450 K in steps of 25 K.
Abstract: We have fabricated p-type crystalline silicon (Si) solar cells using screen-printing process and investigated their electrical properties. Ph screen printing process led to the uniform formation of n+ emitter. As a result of interaction between Ph-dopant paste and Si substrate, a phosphosilicate glass layer was formed on n+ emitter surface. The current-voltage characteristics were carried out in the temperature range of 175 – 450 K in steps of 25 K. The variation in current level at a particular voltage strongly depended on temperature, indicating that the current transport across the junction was a temperature activated process. The reverse leakage current gradually increased with increasing measurement temperature up to 350 K, above which it rapidly increased. Arrhenius plot of the leakage current revealed that reverse leakage current in low and high temperature regions were dominated by the tunneling mechanism, and generation and recombination mechanism, respectively. Keywords: P-type Si solar cell, screen-printing, I-V, tunneling, generation and recombination, reverse leakage current

Cited by
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Journal ArticleDOI
TL;DR: In this article, a carrier-selective tunnel oxide passivated rear contact for high-efficiency screen-printed large area n-type front junction crystalline Si solar cells was proposed.
Abstract: This paper reports on the implementation of carrier-selective tunnel oxide passivated rear contact for high-efficiency screen-printed large area n-type front junction crystalline Si solar cells. It is shown that the tunnel oxide grown in nitric acid at room temperature (25°C) and capped with n+ polysilicon layer provides excellent rear contact passivation with implied open-circuit voltage iVoc of 714 mV and saturation current density J0b′ of 10.3 fA/cm2 for the back surface field region. The durability of this passivation scheme is also investigated for a back-end high temperature process. In combination with an ion-implanted Al2O3-passivated boron emitter and screen-printed front metal grids, this passivated rear contact enabled 21.2% efficient front junction Si solar cells on 239 cm2 commercial grade n-type Czochralski wafers. Copyright © 2016 John Wiley & Sons, Ltd.

83 citations

Journal ArticleDOI
TL;DR: Investigations of inkjet-printing in the field of silicon photovoltaics are reviewed, focusing on the different inkjet processes for individual fabrication steps of a solar cell.
Abstract: The world's ever increasing demand for energy necessitates technologies that generate electricity from inexhaustible and easily accessible energy sources. Silicon photovoltaics is a technology that can harvest the energy of sunlight. Its great characteristics have fueled research and development activities in this exciting field for many years now. One of the most important activities in the solar cell community is the investigation of alternative fabrication and structuring technologies, ideally serving both of the two main goals: device optimization and reduction of fabrication costs. Inkjet technology is practically evaluated along the whole process chain. Research activities cover many processes, such as surface texturing, emitter formation, or metallization. Furthermore, the inkjet technology itself is manifold as well. It can be used to apply inks that serve as a functional structure, present in the final device, as mask for subsequent structuring steps, or even serve as a reactant source to activate chemical etch reactions. This article reviews investigations of inkjet-printing in the field of silicon photovoltaics. The focus is on the different inkjet processes for individual fabrication steps of a solar cell. A technological overview and suggestions about where future work will be focused on are also provided. The great variety of the investigated processes highlights the ability of the inkjet technology to find its way into many other areas of functional printing and printed electronics.

66 citations

Journal ArticleDOI
TL;DR: A review of various solar cell structures that can be realized on n-type crystalline silicon substrates will be given and the current standing of solar cell technology based onn-type substrates and its contribution in photovoltaic industry will be discussed.
Abstract: The p-type crystalline silicon wafers have occupied most of the solar cell market today. However, modules made with n-type crystalline silicon wafers are actually the most efficient modules up to date. This is because the material properties offered by n-type crystalline silicon substrates are suitable for higher efficiencies. Properties such as the absence of boron-oxygen related defects and a greater tolerance to key metal impurities by n-type crystalline silicon substrates are major factors that underline the efficiency of n-type crystalline silicon wafer modules. The bi-facial design of n-type cells with good rear-side electronic and optical properties on an industrial scale can be shaped as well. Furthermore, the development in the industrialization of solar cell designs based on n-type crystalline silicon substrates also highlights its boost in the contributions to the photovoltaic industry. In this paper, a review of various solar cell structures that can be realized on n-type crystalline silicon substrates will be given. Moreover, the current standing of solar cell technology based on n-type substrates and its contribution in photovoltaic industry will also be discussed.

66 citations

Journal ArticleDOI
TL;DR: In this article, the fabrication of front junction n-type Si solar cells on 239 cm 2 Cz using ion implanted boron emitter and phosphorus back surface field (BSF) in combination with screen printed metallization was reported.

43 citations

Journal ArticleDOI
TL;DR: In this article, a fully ion-implanted screen-printed high-efficiency 239 cm2 n-type silicon solar cells that are fabricated on pseudosquare Czochralski wafers were presented.
Abstract: In this study, we present fully ion-implanted screen-printed high-efficiency 239 cm2 n-type silicon solar cells that are fabricated on pseudosquare Czochralski wafers. Implanted boron emitter and phosphorous back-surface field (BSF) were optimized to produce n-type front junction cells with front and back SiO2 /SiNx surface passivation and rear point contacts. Average efficiency of 19.8%, with the best efficiency of 20.2%, certified by Fraunhofer ISE, Freiburg, Germany, was achieved. In addition, the planarized rear side gave better surface passivation, in combination with optimized BSF profile, raised the average efficiency to ~20% for the fully implanted and screen-printed n-type passivated emitter, rear totally diffused cells.

32 citations