I. N. Goncharuk

Bio: I. N. Goncharuk is an academic researcher from Russian Academy of Sciences. The author has contributed to research in topics: Raman spectroscopy & Raman scattering. The author has an hindex of 11, co-authored 24 publications receiving 1550 citations.

Phonon dispersion and Raman scattering in hexagonal GaN and AlN

Abstract: We present the results of room- and low-temperature measurements of second-order Raman scattering for perfect GaN and AlN crystals as well as the Raman-scattering data for strongly disordered samples. A complete group-theory analysis of phonon symmetry throughout the Brillouin zone and symmetry behavior of phonon branches, including the analysis of critical points, has been performed. The combined treatment of these results and the lattice dynamical calculations based on the phenomenological interatomic potential model allowed us to obtain the reliable data on the phonon dispersion curves and phonon density-of-states functions in bulk GaN and AlN. @S0163-1829~98!06840-4#

Raman and photoluminescence studies of biaxial strain in GaN epitaxial layers grown on 6H–SiC

Abstract: The effect of biaxial strain on optical phonons in high-quality GaN epitaxial layers grown on 6H–SiC substrates by metal organic chemical vapor deposition has been studied. The deformation potential constants for the E2(1), A1(TO), E1(TO), and E2(2) optical phonon modes in hexagonal GaN have been obtained. A method for calculating strain in hexagonal GaN layers from Raman data alone is suggested. A comparative analysis of the strain measured by x-ray diffraction and Raman spectroscopy shows that these data agree well. It is found that the biaxial stress of 1 GPa results in a shift of the excitonic photoluminescence lines of 20±3 meV.

Experimental and theoretical studies of phonons in hexagonal InN

Abstract: The first- and second-order Raman scattering and IR reflection have been studied for hexagonal InN layers grown on (0001) and (1102) sapphire substrates. All six Raman-active optical phonons were observed and assigned: E2(low) at 87 cm−1, E2(high) at 488 cm−1, A1(TO) at 447 cm−1, E1(TO) at 476 cm−1, A1(LO) at 586 cm−1, and E1(LO) at 593 cm−1. The ratio between the InN static dielectric constants for the ordinary and extraordinary directions was found to be e⊥0/e∥0=0.91. The phonon dispersion curves, phonon density-of-state function, and lattice specific heat were calculated. The Debye temperature at 0 K for hexagonal InN was estimated to be 370 K.

Composition dependence of optical phonon energies and Raman line broadening in hexagonal Al x Ga 1 − x N alloys

Abstract: Studies of first- and second-order Raman scattering in hexagonal ${\mathrm{Al}}_{x}{\mathrm{Ga}}_{1\ensuremath{-}x}\mathrm{N}$ alloys are reported. The dependences of frequencies of all Raman-allowed optical phonons versus Al content are traced in detail in the entire composition range. The one-mode behavior of LO phonons and the two-mode behavior of the other phonons is established. It is shown that the composition dependences of ${A}_{1}(\mathrm{TO}),$ ${A}_{1}(\mathrm{LO}),$ ${E}_{1}(\mathrm{LO}),$ and ${E}_{2}(\mathrm{low})$ phonon energies are convenient tools for the quantitative characterization of the Al content in ${\mathrm{Al}}_{x}{\mathrm{Ga}}_{1\ensuremath{-}x}\mathrm{N}$ alloys. The energy position of the ${B}_{1}(\mathrm{high})$ silent mode is proposed. A narrow gap separating the dispersion regions of transverse and longitudinal optical phonons is revealed in the phonon density-of-state function. The composition dependence of the phonon line broadening is investigated experimentally and theoretically. It is shown that the broadening is due to elastic phonon scattering by the composition fluctuations. A theoretical approach is used where the statistical and dynamical aspects of the phonon scattering are treated separately. The type, size, and number of the fluctuations responsible for the phonon line broadening are estimated. The theory is qualitatively consistent with the observed composition dependences.

Band parameters for nitrogen-containing semiconductors

Abstract: We present a comprehensive and up-to-date compilation of band parameters for all of the nitrogen-containing III–V semiconductors that have been investigated to date. The two main classes are: (1) “conventional” nitrides (wurtzite and zinc-blende GaN, InN, and AlN, along with their alloys) and (2) “dilute” nitrides (zinc-blende ternaries and quaternaries in which a relatively small fraction of N is added to a host III–V material, e.g., GaAsN and GaInAsN). As in our more general review of III–V semiconductor band parameters [I. Vurgaftman et al., J. Appl. Phys. 89, 5815 (2001)], complete and consistent parameter sets are recommended on the basis of a thorough and critical review of the existing literature. We tabulate the direct and indirect energy gaps, spin-orbit and crystal-field splittings, alloy bowing parameters, electron and hole effective masses, deformation potentials, elastic constants, piezoelectric and spontaneous polarization coefficients, as well as heterostructure band offsets. Temperature an...

Absorption and Emission of Hexagonal InN. Evidence of Narrow Fundamental Band Gap.

Abstract: (a) Ioffe Physico-Technical Institute, Russian Academy of Science, Polytekhnicheskaya 26, 194021 St. Petersburg, Russia (b) Institut für Festkörpertheorie and Theoretische Optik, Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, D-07743 Jena, Germany (c) Department of Electronics and Information Science, Kyoto Institute of Technology, Matsugasaki, Sakyo-ku, Kyoto 606-8585, Japan (d) Institute of Solid State and Semiconductor Physics, Belarus Academy of Sciences, Brovki 17, 220072 Minsk, Belarus (e) LfI, University of Hannover, Schneiderberg 32, D-30167 Hannover, Germany

X-ray diffraction of III-nitrides

Abstract: The III-nitrides include the semiconductors AlN, GaN and InN, which have band gaps spanning the entire UV and visible ranges. Thin films of III-nitrides are used to make UV, violet, blue and green light-emitting diodes and lasers, as well as solar cells, high-electron mobility transistors (HEMTs) and other devices. However, the film growth process gives rise to unusually high strain and high defect densities, which can affect the device performance. X-ray diffraction is a popular, non-destructive technique used to characterize films and device structures, allowing improvements in device efficiencies to be made. It provides information on crystalline lattice parameters (from which strain and composition are determined), misorientation (from which defect types and densities may be deduced), crystallite size and microstrain, wafer bowing, residual stress, alloy ordering, phase separation (if present) along with film thicknesses and superlattice (quantum well) thicknesses, compositions and non-uniformities. These topics are reviewed, along with the basic principles of x-ray diffraction of thin films and areas of special current interest, such as analysis of non-polar, semipolar and cubic III-nitrides. A summary of useful values needed in calculations, including elastic constants and lattice parameters, is also given. Such topics are also likely to be relevant to other highly lattice-mismatched wurtzite-structure materials such as heteroepitaxial ZnO and ZnSe.

When group-III nitrides go infrared: New properties and perspectives

Abstract: Wide-band-gap GaN and Ga-rich InGaN alloys, with energy gaps covering the blue and near-ultraviolet parts of the electromagnetic spectrum, are one group of the dominant materials for solid state lighting and lasing technologies and consequently, have been studied very well. Much less effort has been devoted to InN and In-rich InGaN alloys. A major breakthrough in 2002, stemming from much improved quality of InN films grown using molecular beam epitaxy, resulted in the bandgap of InN being revised from 1.9 eV to a much narrower value of 0.64 eV. This finding triggered a worldwide research thrust into the area of narrow-band-gap group-III nitrides. The low value of the InN bandgap provides a basis for a consistent description of the electronic structure of InGaN and InAlN alloys with all compositions. It extends the fundamental bandgap of the group III-nitride alloy system over a wider spectral region, ranging from the near infrared at ∼1.9 μm (0.64 eV for InN) to the ultraviolet at ∼0.36 μm (3.4 eV for GaN...

Indium nitride (InN): A review on growth, characterization, and properties

Abstract: During the last few years the interest in the indium nitride (InN) semiconductor has been remarkable. There have been significant improvements in the growth of InN films. High quality single crystalline InN film with two-dimensional growth and high growth rate are now routinely obtained. The background carrier concentration and Hall mobility have also improved. Observation of strong photoluminescence near the band edge is reported very recently, leading to conflicts concerning the exact band gap of InN. Attempts have also been made on the deposition of InN based heterostructures for the fabrication of InN based electronic devices. Preliminary evidence of two-dimensional electron gas accumulation in the InN and studies on InN-based field-effect transistor structure are reported. In this article, the work accomplished in the InN research, from its evolution to till now, is reviewed. The In containing alloys or other nitrides (AlGaInN, GaN,AlN) are not discussed here. We mainly concentrate on the growth, characterization, and recent developments in InN research. The most popular growth techniques, metalorganic vapor phase epitaxy and molecular beam epitaxy, are discussed in detail with their recent progress. Important phenomena in the epitaxialgrowth of InN as well as the problems remaining for future study are also discussed.