J. Alexander Liddle

TL;DR: The achievement of sub-15-nm spatial resolution with a soft X-ray microscope—and a clear path to below 10 nm—using an overlay technique for zone plate fabrication is reported.

TL;DR: In this paper, a facile method for reproducibly fabricating large-scale device arrays, suitable for nanoelectronics or nanophotonics, that incorporate a controlled number of sub-50-nm-diameter nanocrystals at lithographically defined precise locations on a chip and within a circuit is presented.

TL;DR: This work considers the factors involved in matching processes with products, examining the characteristics and potential of top-down and bottom-up processes, and their combination, and how a careful assessment of the way in which function can be made to follow form can enable high-volume manufacturing of nanoscale structures with the desired useful, and exciting, properties.

TL;DR: Important details of the SIS process are elucidated, including TMA adsorption in PMMA occurs through a weakly-bound intermediate, and dynamic structural changes occur during the individual precursor exposures, which have important implications for applications such as SIS lithography.

TL;DR: Magnetic materials with dimensions of a few tens of nanometers are important for the development of ultrahigh-density magnetic storage and sensor devices Magnetic microstructure largely determines functionality, and imaging of magnetic domains and magnetization reversal behavior is an outstanding challenge Magnetic X-ray microscopy makes it possible to investigate magnetization phenomena with elemental specificity and high spatial and temporal resolution as mentioned in this paper.