J. Bur

TL;DR: In this article, the authors constructed a 3D infrared photonic crystal on a silicon wafer using relatively standard microelectronics fabrication technology, which showed a large stop band (10−14.5μm), strong attenuation of light within this band (∼12 dB per unit cell) and a spectral response uniform to better than 1 per cent over the area of the 6-inch wafer.

TL;DR: The study indicates two key mechanisms for the performance improvement, an optimized 2DHA design that permits an efficient coupling of light from the far-field to a localized plasmonic mode and the close spatial matching of the QD layers to the wave function extent of the plasMonic mode.

TL;DR: In this article, a planar blackbody structure of a 3D photonic crystal was used to suppress silicon thermal radiation in the photonic band gap spectral regime, which was found to be highly effective in suppressing photonic thermal radiation.

TL;DR: In this paper, a 3D Si spiral photonic crystal has been realized by oblique angle deposition with a new approach of substrate "swing" rotation, and the arms of the spirals can be grown with a uniform diameter.

TL;DR: In this paper, a metallic coating method is used to modify the optical properties of a dielectric photonic lattice and to achieve a near visible photonic band edge, which is made possible by the fact that copper is a good conductor at visible wavelengths.