J
Jacopo Simoni
Researcher at Los Alamos National Laboratory
Publications - 13
Citations - 67
Jacopo Simoni is an academic researcher from Los Alamos National Laboratory. The author has contributed to research in topics: Adiabatic process & Spin–orbit interaction. The author has an hindex of 3, co-authored 6 publications receiving 33 citations. Previous affiliations of Jacopo Simoni include Trinity College, Dublin.
Papers
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Role of spin-orbit interaction in the ultrafast demagnetization of small iron clusters
TL;DR: In this paper, the effect of spin-orbit interaction on the onset of the demagnetization process is investigated, and it is shown that the initial rate of spin loss, coherent with the laser field, is proportional to the square of the ionic spinorbit coupling strength.
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Ultrafast demagnetizing fields from first principles
TL;DR: In this paper, the authors examined the ultrafast demagnetization process of iron-based materials, namely, ${\mathrm{Fe}}_{6}$ clusters and bulk bcc Fe, with time-dependent spin-density functional theory (TDSDFT).
Effect of localization on photoluminescence and zero-field splitting of silicon color centers
Vsevolod I. Ivanov,Jacopo Simoni,Yeong-Rim Lee,Wei Li,Kaushalya Jhuria,Walid Redjem,Yertay Zhiyenbayev,Wayesh Qarony,Boubacar Kante,Arun Persaud,Thomas Schenkel,Liang Z. Tan +11 more
TL;DR: In this paper , the authors employ density functional theory to characterize the defect centers, providing insight into the relaxed structures, bandstructures, and photoluminescence spectra, which are compared to experimental results.
Journal ArticleDOI
Defect engineering of silicon with ion pulses from laser acceleration
Walid Redjem,A.Amsellem,Frances I. Allen,Gabriele Benndorf,Jianhui Bin,Stepan Bulanov,Eric Esarey,Leonard C. Feldman,J. F. Fernandez,Javier Garcia Lopez,Laura Geulig,C. G. R. Geddes,Hussein Hijazi,Qing Ji,Vsevolod I. Ivanov,Boubacar Kante,Anthony Gonsalves,Jan Meijer,K. Nakamura,Arun Persaud,I. Pong,Lieselotte Obst-Huebl,Peter A. Seidl,Jacopo Simoni,Carl Schroeder,Sven Steinke,Liang Z. Tan,Ralf Wunderlich,Brian Wynne,Thomas Schenkel +29 more
TL;DR: In this paper , defect engineering of silicon with ion pulses from a laser accelerator in the laser intensity range of 10 19 W cm −2 and ion flux levels of up to 10 22 ions cm − 2 s −1 , about five orders of magnitude higher than conventional ion implanters.