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Jeffrey W. Elam

Researcher at Argonne National Laboratory

Publications -  462
Citations -  27830

Jeffrey W. Elam is an academic researcher from Argonne National Laboratory. The author has contributed to research in topics: Atomic layer deposition & Thin film. The author has an hindex of 83, co-authored 435 publications receiving 24543 citations. Previous affiliations of Jeffrey W. Elam include ELAM & University of Colorado Boulder.

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Low-Temperature Al2O3 Atomic Layer Deposition

TL;DR: In this article, the properties of low-temperature Al2O3 ALD films were investigated versus growth temperature by depositing films on Si(100) substrates and quartz crystal microbalance (QCM) sensors.
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ZnO Nanotube Based Dye-Sensitized Solar Cells

TL;DR: The novel fabrication technique provides a facile, metal-oxide general route to well-defined DSSC photoanodes, and shows exceptional photovoltage and fill factors, in addition to power efficiencies up to 1.6%.
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Increased Silver Activity for Direct Propylene Epoxidation via Subnanometer Size Effects

TL;DR: It is found that unpromoted, size-selected Ag3 clusters and ~3.5-nanometer Ag nanoparticles on alumina supports can catalyze this reaction with only a negligible amount of carbon dioxide formation and with high activity at low temperatures.
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Electrical characterization of thin Al2O3 films grown by atomic layer deposition on silicon and various metal substrates

TL;DR: Al2O3 films with thicknesses ranging from 30 to 3540 A were grown in a viscous flow reactor using ALD with trimethylaluminum and water as the reactants as mentioned in this paper.
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Subnanometre platinum clusters as highly active and selective catalysts for the oxidative dehydrogenation of propane.

TL;DR: Quantum chemical calculations indicate that under-coordination of the Pt atoms in the clusters is responsible for the surprisingly high reactivity compared with extended surfaces, which is expected to form the basis for development of a new class of catalysts.