Author
Jens Gobrecht
Other affiliations: University of Applied Sciences and Arts Northwestern Switzerland FHNW, École Polytechnique Fédérale de Lausanne
Bio: Jens Gobrecht is an academic researcher from Paul Scherrer Institute. The author has contributed to research in topics: Nanoimprint lithography & Photolithography. The author has an hindex of 35, co-authored 112 publications receiving 4219 citations. Previous affiliations of Jens Gobrecht include University of Applied Sciences and Arts Northwestern Switzerland FHNW & École Polytechnique Fédérale de Lausanne.
Papers published on a yearly basis
Papers
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TL;DR: The enhanced precision of top-down nanofabrication is used to prepare controlled and precisely tunable model systems that allow us to quantify the efficiency and spatial extent of hydrogen spillover on both reducible and nonreducible supports.
Abstract: The mechanism of hydrogen spillover is described using a precisely nanofabricated model system, explaining why it is slower on an aluminum oxide catalyst support than on a titanium oxide catalyst support.
533 citations
TL;DR: In this article, the viscous flow of thin PMMA films into microcavities during hot embossing has been investigated in order to optimise the molding process for nanostructured surfaces.
354 citations
TL;DR: It is shown that streptavidin selectively adsorbs on the biotin areas and thus can be used as a universal platform for immobilization of biotin-tagged molecules.
Abstract: We describe a novel parallel method for the patterning of proteins with nanoscale resolution. Combining nanoimprint lithography (NIL) and molecular assembly patterning by lift-off (MAPL), we produc...
211 citations
TL;DR: In this paper, transmission diffraction gratings were used in an interferometric setup to pattern one-and two-dimensional periodic patterns with periods near 50 nm, which offered a multiplication of pattern frequency by a factor of 2 and √2 in the one and two dimensional cases, respectively.
198 citations
TL;DR: In this article, it was shown that it is possible to fabricate nanostructures with a replication fidelity of 25 nanometers with both hot embossing and injection molding.
157 citations
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TL;DR: The past decade has seen significant advances in the ability to fabricate new porous solids with ordered structures from a wide range of different materials, which has resulted in materials with unusual properties and broadened their application range beyond the traditional use as catalysts and adsorbents.
Abstract: "Space—the final frontier." This preamble to a well-known television series captures the challenge encountered not only in space travel adventures, but also in the field of porous materials, which aims to control the size, shape and uniformity of the porous space and the atoms and molecules that define it. The past decade has seen significant advances in the ability to fabricate new porous solids with ordered structures from a wide range of different materials. This has resulted in materials with unusual properties and broadened their application range beyond the traditional use as catalysts and adsorbents. In fact, porous materials now seem set to contribute to developments in areas ranging from microelectronics to medical diagnosis.
4,599 citations
1,874 citations
Book•
01 Jan 1971
TL;DR: In this paper, Ozaki et al. describe the dynamics of adsorption and Oxidation of organic Molecules on Illuminated Titanium Dioxide Particles Immersed in Water.
Abstract: 1: Magnetic Particles: Preparation, Properties and Applications: M. Ozaki. 2: Maghemite (gamma-Fe2O3): A Versatile Magnetic Colloidal Material C.J. Serna, M.P. Morales. 3: Dynamics of Adsorption and Oxidation of Organic Molecules on Illuminated Titanium Dioxide Particles Immersed in Water M.A. Blesa, R.J. Candal, S.A. Bilmes. 4: Colloidal Aggregation in Two-Dimensions A. Moncho-Jorda, F. Martinez-Lopez, M.A. Cabrerizo-Vilchez, R. Hidalgo Alvarez, M. Quesada-PMerez. 5: Kinetics of Particle and Protein Adsorption Z. Adamczyk.
1,870 citations
TL;DR: The integration of thin films of block copolymer with advanced lithographic techniques to induce epitaxial self-assembly of domains are demonstrated and illustrate how hybrid strategies to nanofabrication allow for molecular level control in existing manufacturing processes.
Abstract: Parallel processes for patterning densely packed nanometre-scale structures are critical for many diverse areas of nanotechnology. Thin films of diblock copolymers can self-assemble into ordered periodic structures at the molecular scale (approximately 5 to 50 nm), and have been used as templates to fabricate quantum dots, nanowires, magnetic storage media, nanopores and silicon capacitors. Unfortunately, perfect periodic domain ordering can only be achieved over micrometre-scale areas at best and defects exist at the edges of grain boundaries. These limitations preclude the use of block-copolymer lithography for many advanced applications. Graphoepitaxy, in-plane electric fields, temperature gradients, and directional solidification have also been demonstrated to induce orientation or long-range order with varying degrees of success. Here we demonstrate the integration of thin films of block copolymer with advanced lithographic techniques to induce epitaxial self-assembly of domains. The resulting patterns are defect-free, are oriented and registered with the underlying substrate and can be created over arbitrarily large areas. These structures are determined by the size and quality of the lithographically defined surface pattern rather than by the inherent limitations of the self-assembly process. Our results illustrate how hybrid strategies to nanofabrication allow for molecular level control in existing manufacturing processes.
1,665 citations
TL;DR: In this paper, the basic principles of nano-printing are discussed, with an emphasis on the requirements on materials for the imprinting mold, surface properties, and resist materials for successful and reliable nanostructure replication.
Abstract: Nanoimprint lithography (NIL) is a nonconventional lithographic technique for high-throughput patterning of polymer nanostructures at great precision and at low costs. Unlike traditional lithographic approaches, which achieve pattern definition through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the resist material and can therefore achieve resolutions beyond the limitations set by light diffraction or beam scattering that are encountered in conventional techniques. This Review covers the basic principles of nanoimprinting, with an emphasis on the requirements on materials for the imprinting mold, surface properties, and resist materials for successful and reliable nanostructure replication.
1,644 citations