J
Jerzy Kanicki
Researcher at University of Michigan
Publications - 341
Citations - 8068
Jerzy Kanicki is an academic researcher from University of Michigan. The author has contributed to research in topics: Thin-film transistor & Threshold voltage. The author has an hindex of 46, co-authored 341 publications receiving 7653 citations. Previous affiliations of Jerzy Kanicki include University of Utah & Pennsylvania State University.
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Journal ArticleDOI
Bias‐stress‐induced stretched‐exponential time dependence of charge injection and trapping in amorphous thin‐film transistors
Frank R. Libsch,Jerzy Kanicki +1 more
TL;DR: In this article, the threshold voltage instabilities in nitride/oxide dual gate dielectric amorphous silicon (a•Si:H) thin-film transistors are investigated as a function of stress time, stress temperature, and stress bias.
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Thin-film organic polymer phototransistors
TL;DR: In this article, the electrical performance of organic polymer thin-film transistors under steady-state white-light illumination, as well as the performance of these devices as photodetectors, was studied.
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Two-dimensional numerical simulation of radio frequency sputter amorphous In–Ga–Zn–O thin-film transistors
Tze Ching Fung,Chiao-Shun Chuang,Charlene Chen,Katsumi Abe,Robert D. Cottle,Mark Townsend,Hideya Kumomi,Jerzy Kanicki +7 more
TL;DR: In this article, a two-dimensional simulation of electrical properties of the radio frequency (RF) sputter amorphous In-Ga-Zn-O (a-IGZO) thin-film transistors (TFTs) is presented.
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Current-source a-Si:H thin-film transistor circuit for active-matrix organic light-emitting displays
TL;DR: In this article, a four thin-film transistor (TFT) circuit based on hydrogenated amorphous silicon (a-Si:H) technology was proposed to provide a constant output current level and can be automatically adjusted for TFT threshold voltage variations.
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Electrically active point defects in amorphous silicon nitride: An illumination and charge injection study
TL;DR: In this paper, a strong correlation between changes in the density of paramagnetic silicon "dangling-bond" centers and changes in space charge density in amorphous silicon nitride films subjected alternately to illumination and both positive and negative charge injection was observed.