Jia-Ahn Pan

Bio: Jia-Ahn Pan is an academic researcher from University of Chicago. The author has contributed to research in topics: Medicine & Photolithography. The author has an hindex of 3, co-authored 6 publications receiving 56 citations. Previous affiliations of Jia-Ahn Pan include University of Hamburg.

Direct Wavelength-Selective Optical and Electron-Beam Lithography of Functional Inorganic Nanomaterials.

Abstract: Direct optical lithography of functional inorganic nanomaterials (DOLFIN) is a photoresist-free method for high-resolution patterning of inorganic nanocrystals (NCs) that has been demonstrated using deep UV (DUV, 254 nm) photons. Here, we expand the versatility of DOLFIN by designing a series of photochemically active NC surface ligands for direct patterning using various photon energies including DUV, near-UV (i-line, 365 nm), blue (h-line, 405 nm), and visible (450 nm) light. We show that the exposure dose for DOLFIN can be ∼30 mJ/cm2, which is small compared to most commercial photopolymer resists. Patterned nanomaterials can serve as highly robust optical diffraction gratings. We also introduce a general approach for resist-free direct electron-beam lithography of functional inorganic nanomaterials (DELFIN) which enables all-inorganic NC patterns with feature size down to 30 nm, while preserving the optical and electronic properties of patterned NCs. The designed ligand chemistries and patterning techniques offer a versatile platform for nano- and micron-scale additive manufacturing, complementing the existing toolbox for device fabrication.

Direct Optical Patterning of Quantum Dot Light-Emitting Diodes via In Situ Ligand Exchange.

Abstract: Precise patterning of quantum dot (QD) layers is an important prerequisite for fabricating QD light-emitting diode (QLED) displays and other optoelectronic devices. However, conventional patterning methods cannot simultaneously meet the stringent requirements of resolution, throughput, and uniformity of the pattern profile while maintaining a high photoluminescence quantum yield (PLQY) of the patterned QD layers. Here, a specially designed nanocrystal ink is introduced, "photopatternable emissive nanocrystals" (PENs), which satisfies these requirements. Photoacid generators in the PEN inks allow photoresist-free, high-resolution optical patterning of QDs through photochemical reactions and in situ ligand exchange in QD films. Various fluorescence and electroluminescence patterns with a feature size down to ≈1.5 µm are demonstrated using red, green, and blue PEN inks. The patterned QD films maintain ≈75% of original PLQY and the electroluminescence characteristics of the patterned QLEDs are comparable to thopse of non-patterned control devices. The patterning mechanism is elucidated by in-depth investigation of the photochemical transformations of the photoacid generators and changes in the optical properties of the QDs at each patterning step. This advanced patterning method provides a new way for additive manufacturing of integrated optoelectronic devices using colloidal QDs.

Fabrication of Chemically Tunable, Hierarchically Branched Polymeric Nanostructures by Multi-branched Anodic Aluminum Oxide Templates.

Abstract: In this paper, a template-assisted replication method is demonstrated for the fabrication of hierarchically branched polymeric nanostructures composed of post-modifiable poly(pentafluorophenyl acrylate). Anodic aluminum oxide templates with various shapes of hierarchically branched pores are fabricated by an asymmetric two-step anodization process. The hierarchical polymeric nanostructures are obtained by infiltration of pentafluorophenyl acrylate with a cross-linker and photoinitiator, followed by polymerization and selective removal of the template. Furthermore, the nanostructures containing reactive pentafluorophenyl ester are modified with spiropyran amine via post-polymerization modification to fabricate ultraviolet-responsive nanostructures. This method can be readily extended to other amines and offers a generalized strategy for controlling functionality and wettability of surfaces.

Direct Optical Lithography of CsPbX3 Nanocrystals via Photoinduced Ligand Cleavage with Postpatterning Chemical Modification and Electronic Coupling.

Abstract: Microscale patterning of solution-processed nanomaterials is important for integration in functional devices. Colloidal lead halide perovskite (LHP) nanocrystals (NCs) can be particularly challenging to pattern due to their incompatibility with polar solvents and lability of surface ligands. Here, we introduce a direct photopatterning approach for LHP NCs through the binding and subsequent cleavage of a photosensitive oxime sulfonate ester (-C═N-OSOO-). The photosensitizer binds to the NCs through its sulfonate group and is cleaved at the N-O bond during photoirradiation with 405 nm light. This bond cleavage decreases the solubility of the NCs, which allows patterns to emerge upon development with toluene. Postpatterning ligand exchange results in photoluminescence quantum yields of up to 79%, while anion exchange provides tunability in the emission wavelength. The patterned NC films show photoconductive behavior, demonstrating that good electrical contact between the NCs can be established.

Direct Optical Lithography of Colloidal Metal Oxide Nanomaterials for Diffractive Optical Elements with 2π Phase Control.

Abstract: Spatially patterned dielectric materials are ubiquitous in electronic, photonic, and optoelectronic devices. These patterns are typically made by subtractive or additive approaches utilizing vapor-phase reagents. On the other hand, recent advances in solution-phase synthesis of oxide nanomaterials have unlocked a materials library with greater compositional, microstructural, and interfacial tunability. However, methods to pattern and integrate these nanomaterials in real-world devices are less established. In this work, we directly optically pattern oxide nanoparticles (NPs) by mixing them with photosensitive diazo-2-naphthol-4-sulfonic acid and irradiating with widely available 405 nm light. We demonstrate the direct optical lithography of ZrO2, TiO2, HfO2, and ITO NPs and investigate the chemical and physical changes responsible for this photoinduced decrease in solubility. Micron-thick layers of amorphous ZrO2 NPs were patterned with micron resolution and shown to allow 2π phase control of visible light. We also show multilayer patterning and use it to fabricate features with different thicknesses and distinct structural colors. Upon annealing at 400 °C, the deposited ZrO2 structures have excellent optical transparency across a wide wavelength range (0.3-10 μm), a high refractive index (n = 1.84 at 633 nm), and are optically smooth. We then fabricate diffractive optical elements, such as binary phase diffraction gratings, that show efficient diffractive behavior and good thermal stability. Different oxide NPs can also be mixed prior to patterning, providing a high level of material tunability. This work demonstrates a general patterning approach that harnesses the processability and diversity of colloidal oxide nanomaterials for use in photonic applications.

A Review of Current Methods in Microfluidic Device Fabrication and Future Commercialization Prospects

Abstract: Microfluidic devices currently play an important role in many biological, chemical, and engineering applications, and there are many ways to fabricate the necessary channel and feature dimensions In this review, we provide an overview of microfabrication techniques that are relevant to both research and commercial use A special emphasis on both the most practical and the recently developed methods for microfluidic device fabrication is applied, and it leads us to specifically address laminate, molding, 3D printing, and high resolution nanofabrication techniques The methods are compared for their relative costs and benefits, with special attention paid to the commercialization prospects of the various technologies

Revisiting anodic alumina templates: from fabrication to applications

Abstract: Anodic porous alumina, –AAO– (also known as nanoporous alumina, nanohole alumina arrays, –NAA– or nanoporous anodized alumina platforms, –NAAP–) has opened new opportunities in a wide range of fields, and is used as an advanced photonic structure for applications in structural coloration and advanced optical biosensing based on the ordered nanoporous structure obtained and as a template to grow nanowires or nanotubes of different materials giving rise to metamaterials with tailored properties. Therefore, understanding the structure of nanoporous anodic alumina templates and knowing how they are fabricated provide a tool for the further design of structures based on them, such as 3D nanoporous structures developed recently. In this work, we review the latest developments related to nanoporous alumina, which is currently a very active field, to provide a solid and thorough reference for all interested experts, both in academia and industry, on these nanostructured and highly useful structures. We present an overview of theories on the formation of pores and self-ordering in alumina, paying special attention to those presented in recent years, and different nanostructures that have been developed recently. Therefore, a wide variety of architectures, ranging from ordered nanoporous structures to diameter changing pores, branched pores, and 3D nanostructures will be discussed. Next, some of the most relevant results using different nanostructured morphologies as templates for the growth of different materials with novel properties and reduced dimensionality in magnetism, thermoelectricity, etc. will be summarised, showing how these structures have influenced the state of the art in a wide variety of fields. Finally, a review on how these anodic aluminium membranes are used as platforms for different applications combined with optical techniques, together with principles behind these applications will be presented, in addition to a hint on the future applications of these versatile nanomaterials. In summary, this review is focused on the most recent developments, without neglecting the basis and older studies that have led the way to these findings. Thus, it gives an updated state-of-the-art review that should be useful not only for experts in the field, but also for non-specialists, helping them to gain a broad understanding of the importance of anodic porous alumina, and most probably, endow them with new ideas for its use in fields of interest or even developing the anodization technique.

High-resolution patterning of colloidal quantum dots via non-destructive, light-driven ligand crosslinking.

Abstract: Establishing multi-colour patterning technology for colloidal quantum dots is critical for realising high-resolution displays based on the material. Here, we report a solution-based processing method to form patterns of quantum dots using a light-driven ligand crosslinker, ethane-1,2-diyl bis(4-azido-2,3,5,6-tetrafluorobenzoate). The crosslinker with two azide end groups can interlock the ligands of neighbouring quantum dots upon exposure to UV, yielding chemically robust quantum dot films. Exploiting the light-driven crosslinking process, different colour CdSe-based core-shell quantum dots can be photo-patterned; quantum dot patterns of red, green and blue primary colours with a sub-pixel size of 4 μm × 16 μm, corresponding to a resolution of >1400 pixels per inch, are demonstrated. The process is non-destructive, such that photoluminescence and electroluminescence characteristics of quantum dot films are preserved after crosslinking. We demonstrate that red crosslinked quantum dot light-emitting diodes exhibiting an external quantum efficiency as high as 14.6% can be obtained. Designing high-resolution displays based on colloidal quantum dots remains a challenge. Here, the authors demonstrate a photo-patterning method to develop CdSe-based core-shell quantum dots patterns of red, green and blue colours with diameters ranging from 7 to 20 nm and resolution of 1400 pixels per inch.

High-resolution, full-color quantum dot light-emitting diode display fabricated via photolithography approach

Abstract: Displays play an extremely important role in modern information society, which creates a never-ending demand for the new and better products and technologies The latest requirements for novel display technologies focus on high resolution and high color gamut Among emerging technologies that include organic light-emitting diode (OLED), micro light-emitting diode (micro-LED), quantum dot light-emitting diode (QLED), laser display, holographic display and others, QLED is promising owing to its intrinsic high color gamut and the possibility to achieve high resolution with photolithography approach However, previously demonstrated photolithography techniques suffer from reduced device performance and color impurities in subpixels from the process In this study, we demonstrated a sacrificial layer assisted patterning (SLAP) approach, which can be applied in conjunction with photolithography to fabricate high-resolution, full-color quantum dot (QD) patterns In this approach, the negative photoresist (PR) and sacrificial layer (SL) were utilized to determine the pixels for QD deposition, while at the same time the SL helps protect the QD layer and keep it intact (named PR-SL approach) To prove this method’s viability for QLED display manufacture, a 500-ppi, full-color passive matrix (PM)-QLED prototype was fabricated via this process Results show that there were no color impurities in the subpixels, and the PM-QLED has a high color gamut of 114% National Television Standards Committee (NTSC) To the best of our knowledge, this is the first full-color QLED prototype with such a high resolution We anticipate that this innovative patterning technique will open a new horizon for future display technologies and may lead to a disruptive and innovative change in display industry